Call for papers ICPST-39 (2022)
The 39th International Conference of Photopolymer Science and Technology
Materials & Processes for Advanced Lithography,
Nanotechnology and Phototechnology
June 27 (Mon) - 30 (Thu), 2022
Details will be announced after decision.
Scopes
The conference covers a wide range of topics relevant to photopolymer science and technology in the following fields:
A. English Symposia
A1. Next Generation Lithography, EB Lithography and Nanotechnology
A2. Nanobiotechnology
A3. Directed Self Assembly (DSA)
A4. Computational / Analytical Approach for Lithography Processes
A5. EUV Lithography
A6. Nanoimprint
A7. 193 nm Lithography Extension and EUV HVM Readiness
A8. Photopolymers in 3-D Printing / Additive Manufacturing
A9. 2D and Stimuli Responsive Materials for Electronics & Photonics
A10. Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices
A11. Chemistry for Advanced Photopolymer Science
A12. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
A13. Fundamentals and Applications of Biomimetics Materials and Processes
A14. General Scopes of Photopolymer Science and Technology
P1. Panel Symposium "Beyond Sub-10 nm Lithography -From a Material Design and Development Perspective-"
B. Japanese Symposia
B1. Polyimides and High Temperature Polymers -Functionalization and Practical Applications-
B2. Plasma Photochemistry and Functionalization of Polymer Surfaces
B3. General Scopes of Photopolymer Science and Technology
Deadline of Application to Scientific Program
February 14, 2022.
Deadline of Submission of Papers
April 1, 2022. The Journal will be published and mailed before ICPST-38.
Deadline of Registration for Participants
May 25, 2022
