Call for papers ICPST-39 (2022) 


Japanese

The 39th International Conference of Photopolymer Science and Technology

Materials & Processes for Advanced Lithography,

Nanotechnology and Phototechnology

 

June 27 (Mon) - 30 (Thu), 2022

 

Details will be announced after decision.

 

Scopes

The conference covers a wide range of topics relevant to photopolymer science and technology in the following fields:

 

A. English Symposia

       

A1.    Next Generation Lithography, EB Lithography and Nanotechnology

A2.    Nanobiotechnology

A3.    Directed Self Assembly (DSA)

A4.    Computational / Analytical Approach for Lithography Processes

A5.    EUV Lithography

A6.    Nanoimprint

A7.    193 nm Lithography Extension and EUV HVM Readiness

A8.    Photopolymers in 3-D Printing / Additive Manufacturing

A9.    2D and Stimuli Responsive Materials for Electronics & Photonics

A10.  Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices

A11.  Chemistry for Advanced Photopolymer Science

A12.  Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices

A13.  Fundamentals and Applications of Biomimetics Materials and Processes

A14.  General Scopes of Photopolymer Science and Technology

 

P1.    Panel Symposium "Beyond Sub-10 nm Lithography -From a Material Design and Development Perspective-" 

 

B. Japanese Symposia

 

B1.    Polyimides and High Temperature Polymers  -Functionalization and Practical Applications-

B2.    Plasma Photochemistry and Functionalization of Polymer Surfaces

B3.    General Scopes of Photopolymer Science and Technology 

 

 

 

Deadline of Application to Scientific Program

February 14, 2022.

 

 

Deadline of Submission of Papers

April 1, 2022. The Journal will be published and mailed before ICPST-38.

 

Deadline of Registration for Participants

May 25, 2022

 

 

 

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ICPST-39 Call for Paper
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