Call for papers ICPST-39 (2022)
The 39th International Conference of Photopolymer Science and Technology
Materials & Processes for Advanced Lithography,
Nanotechnology and Phototechnology
June 27 (Mon) - 30 (Thu), 2022
Introduction
The 39th International Conference of Photopolymer Science and Technology, Materials & Processes for Advanced Lithography, Nanotechnology and Phototechnology (ICPST-39) organized by SPST will be held at International Conference Hall, Makuhari Messe, Chiba, Japan on June 27-30, 2022.
COVID-19 pandemic may change ICPST-39 to an on-line meeting.
The details will appear at the SPST Homepage.
All thecontributors of papers on the scientific progress and the technical development of photopolymers are cordially invited.
Scopes
The conference covers a wide range of topics relevant to photopolymer science and technology in the following fields:
A. English Symposia
A1. Next Generation Lithography, EB Lithography and Nanotechnology
A2. Nanobiotechnology
A3. Directed Self Assembly (DSA)
A4. Computational / Analytical Approach for Lithography Processes
A5. EUV Lithography
A6. Nanoimprint
A7. 193 nm Lithography Extension and EUV HVM Readiness
A8. Photopolymers in 3-D Printing / Additive Manufacturing
A9. 2D and Stimuli Responsive Materials for Electronics & Photonics
A10. Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices
A11. Chemistry for Advanced Photopolymer Science
A12. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
A13. Fundamentals and Applications of Biomimetics Materials and Processes
A14. General Scopes of Photopolymer Science and Technology
P1. Panel Symposium "Beyond Sub-10 nm Lithography -From a Material Design and Development Perspective-"
B. Japanese Symposia
B1. Polyimides and High Temperature Polymers -Functionalization and Practical Applications-
B2. Plasma Photochemistry and Functionalization of Polymer Surfaces
B3. General Scopes of Photopolymer Science and Technology
Language and Oral Presentation Time
English is used for presentations in English Symposia and Panel Symposium. Japanese and English are used for presentations in Japanese Symposia. Each presentation will not be longer than 20 minutes including discussion except for the notified lectures.
Deadline of Application to Scientific Program
February 14, 2022.
Application to Scientific Program
Apply to [Conference → Presentation-Information Submission] at the SPST Homepage (https://www.spst-photopolymer.org/) before February 14, 2022.
Deadline of Submission of Papers
April 1, 2022.
Papers
Papers submitted to ICPST-39 are published in Journal of Photopolymer Science and Technology, Vol. 35 (2022) after reviewing on the Journal's standard. Journal will be distributed to each participant during the conference. Preparation of manuscripts for the Journal should be followed to "Instructions to Authors" and "Manual for Manuscript Writing". Refer “Page Layout Sample” and use “Sample Manuscript (Manuscript Template)”. Submit the manuscripts to [Journal → Submission & Reviewing of MS] at the SPST Homepage before April 1, 2022. The Journal will be published and mailed before ICPST-39.
Editorial Office
Assoc. Prof. Hiroyuki Mayama
Journal of Photopolymer Science and Technology,
Department of Chemistry, Asahikawa Medical University, 2-1-1 Midorigaoka-higashi, Asahikawa 078-8510, Japan
Phone: +81-166-68-2726 Fax: +81-166-68-2782
E-mail: mayama@asahikawa-med.ac.jp
Deadline of Registration for Participants
May 25, 2022
Registration for Participants
All the participants including speakers are requested to register in [Conference → Registration] at the SPST Homepage before May 25, 2022.
Conference Office
The 39th International Conference of Photopolymer Science and Technology (ICPST-39)
c/o Prof. Takashi Karatsu
Department of Applied Chemistry
Chiba University
1-33 Yayoicho, Inage, Chiba 263-8522, Japan
Phone: +81-43-290-3366 Fax: +81-43-290-3401
E-mail office@spst-photopolymer.org
