Call for papers ICPST-41 (2024) .


Japanese

The 41st International Conference of Photopolymer Science and Technology

Materials & Processes for Advanced Lithography,

Nanotechnology and Phototechnology

 

June 25 (Tue) - 28 (Fri), 2024

 

Sponsored by the Society of Photopolymer Science and Technology (SPST)

  In Cooperation with

The Technical Association of  Photopolymers, Japan

The Chemical Society of Japan

The Society of Polymer Science, Japan

  Endorsed by

       The Japan Society of Applied Physics

 

Introduction

The 41st International Conference of Photopolymer Science and Technology, Materials & Processes for Advanced Lithography, Nanotechnology and Phototechnology (ICPST-41) organized by SPST will be held at International Conference Hall, Makuhari Messe, Chiba, Japan, June 25-28, 2024.

 

The details will appear at the SPST Homepage.

All the contributors of papers on the scientific progress and the technical development of photopolymers are cordially invited.

 

 

Scopes

The conference covers a wide range of topics relevant to photopolymer science and technology in the following fields:

 

A. English Symposia

 

A0.       Plenary Talk

A1.       Next Generation Lithography, EB Lithography and Nanotechnology 

A2.       Nanobiotechnology

A3.       Directed Self Assembly (DSA)

→Self-Assembly Materials and Processes (DSA, BCP, SAM, ASD, Infiltration, Nanostructured Materials, Advanced Devices using Self Assembly, etc.)

A4.       Computational / Analytical Approach for Lithography Processes

A5.       EUV Lithography

A6.       Nanoimprint

A7.       193 nm Lithography Extension

A8.       Photopolymers in 3-D Printing/ Additive Manufacturing

A9.       2D and Stimuli Responsive Materials for Electronics & Photonics

A10.    Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices

A11.    Chemistry for Advanced Photopolymer Science

A12.    Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices

A13.    Fundamentals and Applications of Biomimetics Materials and Processes

A14.    Polyimides and High Thermally Stable Resins  -Functionalization and Practical Applications-

A15.    General Scopes of Photopolymer Science and Technology

P.         Panel Symposium

 

 

B. Japanese Symposia

 

B1.      Polyimides and High Thermally Stable Resins  -Functionalization and Practical Applications-

B2.      Plasma Photochemistry and Functionalization of Polymer Surfaces

B3.      General Scopes of Photopolymer Science and Technology

 

 

Language and Oral Presentation Time

 

English is used for presentations in English Symposia and Panel Symposium. Japanese and English are used for presentations in Japanese Symposia. Each presentation will not be longer than 20 minutes including discussion except for the notified lectures. 

 

 

Deadline of Application to Scientific Program

February 14 (Wed), 2024

 

Application to Scientific Program

 

Apply to [Conference → Paper Title Submission] at the SPST Homepage (https://www.spst-photopolymer.org/) before February 14, 2024.

  

 

Deadline of Submission of Papers

April 1 (Mon), 2024. 

Papers

Papers submitted to ICPST-41 are published in Journal of Photopolymer Science and Technology, Vol. 37 (2024) after reviewing on the Journal's standard. Journal will be distributed to each participant during the conference. Preparation of manuscripts for the Journal should be followed to "Instructions to Authors" and "Manual for Manuscript Writing". Refer “Page Layout Sample” and use “Sample Manuscript (Manuscript Template)”. Submit the manuscripts to [Journal → Submission & Reviewing of MS] at the SPST Homepage before April 1, 2024. The Journal will be published and mailed before ICPST-41.

 

 

Editorial Office

Assoc. Prof. Haruyuki Okamura

Journal of Photopolymer Science and Technology,

Department of Applied Chemistry, Osaka Metropolitan University, 1-1 Gakuen-cho,

Naka-ku, Sakai, Osaka 599-9531, Japan

Phone: +81-72-254-9291 Fax: +81-72-254-9291

E-mail: okamura(at)omu.ac.jp

 

 

 

Deadline of Registration for Participants

 

 

Registration for Participants

All the participants including speakers are requested to register in [Conference → Registration] at the SPST Homepage. 

By May 31, 2024.

Registration fee of whole conference is ¥65,000 yen for Participants.

Registration fee of whole conference is ¥10,000 yen for Students.

From June 1, 2024.

Registration fee of whole conference is ¥80,000 yen for Participants.

 

Registration fee of whole conference is ¥15,000 yen for Students.

 

Banquet ¥5,000

 

※In consideration of the recent rise in prices and ongoing operations, SPST has decided to raise the membership fee.

We recommend that you register by the end of May.

 

 

Conference Office

  

The 41st International Conference of Photopolymer Science and Technology (ICPST-41)     

c/o Prof. Hiroto Kudo

Department of Applied Chemistry  

Department of Chemistry and Materials Engineering, 

Kansai University

3-3-35, Yamate-cho, Suita-shi, Osaka, 564-8680, Japan

Phone: +81-6-6368-1977  Fax: +81-6-6368-1977

E-mail kudoh(at)kansai-u.ac.jp

 

 

The Society of Photopolymer Science and Technology (SPST)

President:                                      Takeo Watanabe

Vice President:                             Teruaki Hayakawa

Director of Scientific Program:  Teruaki Hayakawa

Director of Publication:               Haruyuki Okamura

Director of Awards:                      Itaru Osaka

Director of Administration:         Hiroto Kudo

 

Auditor:                                          Takumi Ueno

 

 

ICPST-41 International Advisory Board

Danilo De Simone (Belgium)

Sanjay Malik (USA)

Patrick Naulleau (USA)

 

 

ICPST-41 Organizing Committee

Chairperson: Takeo Watanabe 

Members: Minoru Tsuda, Masataka Endo, Takanori Ichiki, Kouhei Soga, Seiji Ngahara, Teruaki Hyakawa, Takehiro Sejimo, Tomoki Nagai, Hiroto Kudo, Taku Hirayma, Shinji Yamakawa, Yoshihiko Hirai, Jun Taniguchi, Kazuma Kurihara, Yoshio Kawai, Wang Yueh, Robert Allen, Takumi Ueno, Shuhei Seki, Takashi Yamashita, Kuriharu Takei, Takashi Karatsu, Haruyuki Okamura, Akinori Shibuya, Hideo Ohkita, Itaru Osaka, Hiroyuki Mayama, Jun Sekiguchi, Takayuki Murosaki,  Hitoshi Araki, Takashi Hirano, Shin-ichi Kondo, Hideo Horibe, Masashi Yamamoto

 

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