Invitation

Japanese

Dear Colleagues!

 

 

  On behalf of the organizing committees, we cordially invite you to attend the Conference of Photopolymer Science and Technology.

  The Conference will be held by ONLINE from 15 to 17 June, 2021. This will be the latest in a long series of successful symposia, carrying on a tradition of premier biennial gatherings of scientists with interests in photopolymer and related subjects.

  The symposium will provide a framework for presentation and discussion of ideas and information on the interaction of light, matter and process drawn from the following areas;

English Symposia
  • Next Generation Lithography, EB Lithography and Nanotechnology
  • Nanobiotechnology
  • Directed Self Assembly (DSA)
  • Computational / Analytical Approach for Lithography Processes
  • EUV Lithography
  • Nanoimprint
  • 193 nm Lithography Extension and EUV HVM Readiness
  • Photopolymers in 3-D Printing / Additive Manufacturing
  • 2D and Stimuli Responsive Materials for Electronics & Photonics
  • Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices
  • Chemistry for Advanced Photopolymer Science
  • Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
  • Fundamentals and Applications of Biomimetics Materials and Processes
  • Panel Symposium 1 "EUV Lithography toward 10 nm and below"
  • Panel Symposium 2 "Biomimetics: Learn from Nature"
Japanese Symposia
  • Polyimides and High Temperature Polymers  -Functionalization and Practical Applications-
  • General Scopes of Photopolymer Science and Technology 

 

 

  We look forward to seeing you at this stimulating online meeting.

Minoru TSUDA, Chair

 

 

 


 


 


 

 


 

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