ICPST-39 Program


A. English Symposia

 

OP.    Opening Remarks

S1.    Plenary Lecture

 

A1.    Next Generation Lithography, EB Lithography and Nanotechnology

A2.    Nanobiotechnology

A3.    Directed Self Assembly (DSA)

A4.    Computational / Analytical Approach for Lithography Processes

A5.    EUV Lithography

A6.    Nanoimprint

A7.    193 nm Lithography Extension and EUV HVM Readiness

A8.    Photopolymers in 3-D Printing / Additive Manufacturing

A9.    2D and Stimuli Responsive Materials for Electronics & Photonics

A10.  Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices

A11.  Chemistry for Advanced Photopolymer Science

A12.  Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices

A13.  Fundamentals and Applications of Biomimetics Materials and Processes

A14.  General Scopes of Photopolymer Science and Technology

 

P1.    Panel Symposium "Beyond Sub-10 nm Lithography -From a Material Design and Development Perspective-" 

CL.    Closing Remarks

 

B. Japanese Symposia -> Japanese page


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Program (English symposia)
Prgoram (English symposia).pdf
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June 28, Tuesday (Japan Standard Time)


June 29, Wednesday (Japan Standard Time)


June 30, Thursday (Japan Standard Time)


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