39th ICPST time table (online conference site version)
A. English Symposia
OP. Opening Remarks
S1. Plenary Lecture
A1. Next Generation Lithography, EB Lithography and Nanotechnology
A3. Directed Self Assembly (DSA)
A4. Computational / Analytical Approach for Lithography Processes
A5. EUV Lithography
A7. 193 nm Lithography Extension and EUV HVM Readiness
A8. Photopolymers in 3-D Printing / Additive Manufacturing
A9. 2D and Stimuli Responsive Materials for Electronics & Photonics
A10. Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices
A11. Chemistry for Advanced Photopolymer Science
A12. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
A13. Fundamentals and Applications of Biomimetics Materials and Processes
A14. General Scopes of Photopolymer Science and Technology
P1. Panel Symposium "Beyond Sub-10 nm Lithography -From a Material Design and Development Perspective-"
CL. Closing Remarks
B. Japanese Symposia -> Japanese page
The data and time is shown in JST (Japan standard time).
Please access the following URL to convert to your time zone.
Timezone Converter URL: https://www.timeanddate.com/worldclock/converter.html