The Photopolymer Science and Technology Award No. 241100, the Outstanding Achievement Award 2024 was presented to Dr. Makoto Hanabata (Photofunctional Materials Research Co., Ltd.) for
his outstanding achievements in photopolymer science and technology, “Pioneering Technology of the Novolak-Diazonaphthoquinone resist design for g-line(436nm) and i-line(365nm)
photoresist platform and materials”.