Announcement of ICPST-42 (Photopolymer Conference 2025)
The 42nd International Conference of Photopolymer Science and Technology (ICPST-42)
Materials & Processes for Advanced Lithography, Nanotechnology and Phototechnology
June 24 - 27, 2025 at Arcrea HIMEJI, Himeji City, Hyogo, Japan
Himeji City｜Arcrea HIMEJI (himeji-ccc.jp) Map
Scopes
A. English Symposia
A0. Plenary Talk
A1. Next Generation Lithography, EB Lithography and Nanotechnology
A2. Nanobiotechnology
A3. Directed Self Assembly (DSA)
Self-Assembly Materials and Processes (DSA, BCP, SAM, ASD, Infiltration, Nanostructured Materials,
Advanced Devices using Self Assembly, etc.)
A4. Computational / Analytical Approach for Lithography Processes
A5. EUV Lithography
A6. Nanoimprint
A7. 193 nm Lithography Extension
A8. Photopolymers in 3-D Printing/ Additive Manufacturing
A9. Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices
A10. Chemistry for Advanced Photopolymer Science
A11. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
A12. Fundamentals and Applications of Biomimetics Materials and Processes
A13. Polyimides and High Thermally Stable Resins
A14. General Scopes of Photopolymer Science and Technology
P. Panel Symposium
B. Japanese Symposia
B1. Polyimides and High Thermally Stable Resins
-Functionalization and Practical Applications-
B2. Plasma Photochemistry and Functionalization of Polymer Surfaces
B3. General Scopes of Photopolymer Science and Technology
C. Tutorial Session: Basics of Lithography Materials Science and Technology
Tutorial Session is Joint Event of The Society of Photopolymer Science and Technology (フォトポリマー学会) and The Technical Association of Photopolymers, Japan （フォトポリマー懇話会)
Application and abstract deadline: February 14, 2025
Paper deadline: April 1, 2025
