Announcement of ICPST-42 (Photopolymer Conference 2025)
The 42nd International Conference of Photopolymer Science and Technology (ICPST-42)
Materials & Processes for Advanced Lithography, Nanotechnology and Phototechnology
In Cooperation with The Technical Association of Photopolymers, Japan, The Chemical Society of Japan, The Society of Polymer Science, Japan and The Japan Society of Applied Physics, Japan
June 24 - 27, 2025 at Arcrea HIMEJI, Himeji City, Hyogo, Japan
Himeji City｜Arcrea HIMEJI (himeji-ccc.jp) Map
Facility overview and Direction to the Conference Site (Arcrea HIMEJI) / Gourmet map near Himeji Station
The 42nd International Conference of Photopolymer Science and Technology, Materials & Processes for Advanced Lithography, Nanotechnology and Phototechnology (ICPST-42) organized by SPST will be held at Arcrea HIMEJI, Himeji City, Hyogo, Japan, on June 24-27, 2025. All the contributors of papers on the scientific progress and the technical development related to photopolymers are cordially invited.
ICPST Scopes
ICPST program Chair: Teruaki HAYAKAWA (Institute of Science Tokyo)
A. English Symposia
A0. Plenary Talk - Dr. Jos Benschop, ASML
Symposium Chair: Takeo WATANABE (University of Hyogo)
A1. Next Generation Lithography, EB Lithography and Nanotechnology
Symposium Chair: Masataka ENDO (Osaka University)
A2. Nanobiotechnology
Symposium Chair: Takanori ICHIKI (The University of Tokyo), Kensuke OSADA (Tokyo University of Science)
A3. Directed Self Assembly (DSA)
- Self-Assembly Materials and Processes (DSA, BCP, SAM, ASD, Infiltration, Nanostructured Materials,
Advanced Devices using Self Assembly, etc.) -
Symposium Chairs: Seiji NAGAHARA (ASML Japan) , Teruaki HAYAKAWA (Institute of Science Tokyo),
and Takehiro SESHIMO (Tokyo Ohka Kogyo)
A4. Computational / Analytical Approach for Lithography Processes
Symposium Chairs: Kenji YOSHIMOTO (Kanazawa University), and Sosuke OSAWA (JSR)
A5. EUV Lithography
Symposium Chairs: Takeo WATANABE (University of Hyogo), Hiroto KUDO (Kansai University), Yoshio KAWAI (Shin-Etsu Chemical),
Taku HIRAYAMA (HOYA), Shinji YAMAKAWA (University of Hyogo), Sosuke OSAWA (JSR), and Choong Bong (CB) Lee
A6. Nanoimprint
Symposium Chairs: Yoshihiko HIRAI (Osaka Metropolitan University), Jun TANIGUCHI (Tokyo University of Science),
Satoshi TAKEI (Toyama Prefectural University), and Sosuke OSAWA (JSR) , and Kazuma Kurihara (AIST)
A7. 193 nm Lithography Extension
Symposium Chair: Yoshio KAWAI (Shin-Etsu Chemical)
A8. Photopolymers in 3-D Printing/ Additive Manufacturing
Symposium Chair: Takumi UENO (Shinshu University)
A9. Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices
Symposium Chairs: Takumi UENO (Shinshu University), Sanjay Malik (SCREEN SPE USA), and Kuniharu TAKEI (Hokkaido University),
A10. Chemistry for Advanced Photopolymer Science
Symposium Chairs: Haruyuki OKAMURA (Osaka Metropolitan University), Takashi KARATSU (Chiba University),
and Akinori SHIBUYA (FUJIFILM)
A11. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
Symposium Chairs: Itaru OSAKA (Hiroshima University), and Hideo OHKITA (Kyoto University)
A12. Fundamentals and Applications of Biomimetics Materials and Processes
Symposium Chairs: Hiroyuki MAYAMA (Asahikawa Medical University), Atsushi SEKIGUCHI (Lithotech Japan),
and Takayuki MUROSAKI (Asahikawa Medical University)
A13. Polyimides and High Thermally Stable Resins
Symposium Chair: Teruaki HAYAKAWA (Institute of Science Tokyo)
A14. General Scopes of Photopolymer Science and Technology
Symposium Chair: Teruaki HAYAKAWA (Institute of Science Tokyo)
P. Panel Symposium
Symposium Chairs:
B. Japanese Symposia
B1. Polyimides and High Thermally Stable Resins -Functionalization and Practical Applications-
Symposium Chairs: Teruaki HAYAKAWA (Institute of Science Tokyo), Hitoshi ARAKI (Toray), and Kenji MIYAO (Sumitomo Bakelite)
B2. Plasma Photochemistry and Functionalization of Polymer Surfaces
Symposium Chairs: Shin-ichi KONDO (Gifu Pharmaceutical University)
B3. General Scopes of Photopolymer Science and Technology
Symposium Chairs: Masashi YAMAMOTO (Kagawa Institute of Technology), and Hideo HORIBE (Osaka Metropolitan University)
C. Tutorial Session: Basics of Lithography Materials Science and Technology
Tutorial Session is Joint Event of The Society of Photopolymer Science and Technology (フォトポリマー学会) and The Technical Association of Photopolymers, Japan （フォトポリマー懇話会)
Tutorial Session Organizers: Seiji NAGAHARA (ASML Japan), and Haruyuki OKAMURA (Osaka Metropolitan University)
*The first person in Symposium Chairs will serve as Chief of each Symposium.
Special Event during ICPST
Get together event: on June 24 (free of charge for attendees)
Banquet: Evening of June 26 at HOTEL MONTEREY HIMEJI (pre-registration or on-site registration is needed)
Language and Oral Presentation Time
English is used for presentations in English Symposia and Panel Symposium. Both Japanese and English are used for presentations in Japanese Symposia and Tutorial Session. Each presentation will not be longer than 20 minutes including discussion except for the notified talks.
Membership Fees (Including ICPST-42 participation and its Journal)
By May 31, 2025 Regular Registration 65,000 JPY , Student Registration 10,000 JPY, Banquet 5,000 JPY
From June 1, 2025 Regular Registration 80,000 JPY, Student Registration 15,000 JPY, Banquet 5,000 JPY
In consideration of the recent rise in prices and ongoing operations, SPST has decided the membership fees increase compared to last year.
All the participants including speakers are requested to register from link in this page.
Application and abstract deadline: February 14, 2025
Please submit your presentation title and short abstract for program from the link below. The invited speakers (including Pleanry, Keynote, and Tutorials) are also requested to submit your phtograph and short bio in the system. The information will be posted in web program.
Paper deadline: April 1, 2025
Papers submitted to ICPST-42 are published in Journal of Photopolymer Science and Technology, Vol. 38 (2025) after reviewing on the Journal's standard. Journal will be distributed to each participant during the conference. Submit the manuscripts though the link below before April 1, 2025.
Those who have registered for IPST will be able to access the electronic files of the papers from the AWARD system registration site at the start of the conference. Participants will be notified of the access instructions by email. Please note that printed copies of the papers will no longer be distributed during the conference.
