Journal of Photopolymer Science and Technology Site






Journal of Photopolymer Science and Technology (JPST), which has been published by The Society of Photopolymer Science and Technology (SPST), celebrates its 35th anniversary last year. The editors would like to express their sincere thanks to all authors as well as the readers for warm and sustained supports for this long term of the publication of this Journal.


Advances in technologies of 'the Internet of things' (IoT) and 'information technology' (IT) are due to major advances in semiconductor technology, enabling semiconductor integration by advanced lithographic technologies. The advancement of lithography has been supported by the resist material processing technology, which improves the electronic performance of semiconductor devices such as high speed, low power consumption, integration of ultra large scaled circuits, and reduction of manufacturing cost.


The International Conference of Photopolymer Science and Technology (ICPST) organized by SPST for these 34 years has played an important role as a forum for discussion and information exchange on the resist material process technology used in various lithographic technologies such as g-line, i-line, KrF, ArF, electron beam, and X-ray. ArF immersion lithography is currently used for 22-nm-generation semiconductor manufacturing technology. At last, since 2019, EUV lithography has been used in the mass production of logic semiconductor devices. In addition, EUV lithography, nanoimprint lithography, and DSA technology are still promising candidates for semiconductor nano-fabrication technologies in next-generation and beyond.


For supporting the future IoT technology, advanced techniques of the lithography are required increasingly, where material technologies such as photo-functional groups, photo-acid generators, photo-curable resins, etc. are the driving force for the progress of semiconductor technology with quantum scale and quantum effect. Basic research on photopolymer is more significant in developing new technologies such as quantum device technology with lower power consumption and lower manufacturing cost by combining with life science and quantum device technology.


All the science and technology related to photopolymer technology must be focused for further progress of ICPST. New Symposia will continue to be provided in place of conventional ones. The international symposium of Organic Solar Cells – Materials, Device Physics, and Processes was added in 2015. In addition, the international symposium of Fundamentals and Applications of Biomimetics Materials and Processes was added last year.


Constructive opinions from researchers and scientists are welcomed for future progress of ICPST.







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Journal of Photopolymer Science and Technology is a peer-reviewed journal published papers on the scientific progress and the technical development of photopolymers biannually in June and December.


Editorial Board

Editor-in-Chief: Haruyuki OKAMURA, Osaka Metropolitan University

Editor:    Masayuki ENDO, Osaka University


Taku HIRAYAMA, HOYA Corporation

Hideo HORIBE, Osaka Metropolitan University


Hiroyuki MAYAMA, Asahikawa Medical University

Takayuki MUROSAKI, Asahikawa Medical University

Hideo OHKITA, Kyoto University

Shu SEKI, Kyoto University

Takehiro SESHIMO, Tokyo Ohka Kogyo Co., Ltd.


International Advisory Board

Robert D. ALLEN, IBM Almaden Research Center

Ralph R. DAMMEL, AZ Electronics Materials

Paul F. NEALEY, University of Chicago

Christopher K. OBER, Cornell University

C. Grant WILLSON, The University of Texas


The Editorial Office 

   Assoc. Prof. Haruyuki Okamura

   Department of Applied Chemistry,

   Osaka Metropolitan University,

   1-1 Gakuen-cho, Naka-ku, Sakai,

   Osaka 599-9531, Japan


   E-mail: okamura(at)


Important information: Date of publication of Vol. 36, No. 1 ~ 5 will be June 27, 2023.

Important information: Deadline of the submission of manuscript for the publication in JPST Vol. 36, No. 6 is September 30, 2023.



Submission & Reviewing of Manuscript

Manuscript Preparation