SPST "The Photopolymer Science and Technology Award" Ceremony Announcement

The SPST Award Ceremony took place on Wednesday, June 25th at 9:45 AM in the Medium Hall of Arcrea Himeji.

This year’s distinguished award recipients are listed below.

The Outstanding Achievement Award 2025

Jos Benschop (ASML)

in recognition of his remarkable contributions to the field of photopolymer science and technology, particularly for "bringing EUV Lithography from the research phase to high-volume manufacturing." 

The Best Paper Award 2025

Jordan Greenough, Nitinkumar S. Uphadyay, Shaheen Hasan, Munsaf Ali, Ricardo Burke,

Greg Denbeaux, and Robert L. Brainard (University at Albany)

 For Your Outstanding Contributions Published in Journal of Photopolymer Science and Technology

"Positive-Tone Organoantimony Resists," 

Journal of Photopolymer Science and Technology,  Volume 37, Number 3 (2024) 273.

The Best Paper Award 2025

Tomokazu Umeyama¹, Motohisa Kubota², Haoxuan Zhang², Rintaro Adachi³, Akira Yamakata³, Tomoyuki Koganezawa⁴, and Hiroshi Imahori³ (¹ University of Hyogo, ² Kyoto University, ³ Okayama University, ⁴ Japan Synchrotron Radiation Research Institute)

For Your Outstanding Contributions Published in Journal of Photopolymer Science and Technology 

"Development of Non-Fullerene Acceptors with π-Extended Central Unit for Organic Photovoltaic Devices"

Journal of Photopolymer Science and Technology, Volume 37, Number 2 (2024) 197.