ICPST-42 (2025) PROGRAM
TIME TaBLE of ICPST-42
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Tuesday, June 24, 2025 |
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Medium Hall |
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13:00 |
Tutorial |
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13:30 |
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14:00 |
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14:30 |
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15:00 |
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15:30 |
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16:00 |
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16:30 |
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17:00 |
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17:30 |
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18:00 |
Welcome Reception |
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18:30 |
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19:00 |
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19:30 |
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20:00 |
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Wednesday, June 25, 2025 |
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Medium Hall |
Small Hall |
Room 408 |
Room 409 |
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9:30 |
Opening Remarks 9:30-9:45 |
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9:45 |
SPST Award Ceremony |
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10:00 |
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10:30 |
A0. Plenary Talks |
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11:00 |
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11:30 |
Lunch |
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12:00 |
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12:30 |
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13:00 |
A3. |
A2.
technology |
A6. |
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13:30 |
A12. |
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14:00 |
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14:30 |
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15:00 |
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15:30 |
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16:00 |
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16:30 |
A8. Photopolym.
in 3-D Printing/ |
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17:00 |
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17:30 |
Coffee Break with snacks |
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18:00 |
Panel
Discussion |
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18:30 |
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19:00 |
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19:30 |
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20:00 |
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Thursday, June 26, 2025 |
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Medium Hall |
Small Hall |
Room 408 |
Room 409 |
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9:00 |
EUV Lithography |
A9. |
B2. |
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9:30 |
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9:45 |
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10:00 |
B3-5. General Scopes of Photopolymer Science and Technology |
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10:30 |
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11:00 |
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11:30 |
A4. Computational / Analytical Approach for Lithography Processes
193 nm Lithography Extension |
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12:00 |
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12:30 |
Lunch |
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13:00 |
A13. + B1. |
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13:30 |
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14:00 |
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14:30 |
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15:00 |
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15:30 |
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16:00 |
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16:30 |
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17:00 |
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17:30 |
Banquet at Hotel Monterey Himeji |
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18:00 |
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18:30 |
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19:00 |
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19:30 |
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20:00 |
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Friday, June 27, 2025 |
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Medium Hall |
Small Hall |
Room 408 |
Room 409 |
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9:00 |
A5. |
A11. |
B3. General Scopes of Photopolymer Science and Technology |
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9:30 |
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9:45 |
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10:00 |
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10:30 |
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11:00 |
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11:30 |
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12:00 |
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12:30 |
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13:00 |
A10. |
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13:30 |
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14:00 |
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14:30 |
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15:00 |
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15:30 |
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16:00 |
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16:30 |
Closing Remarks 16:45-16:55 |
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17:00 |
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ICPST-42 Program
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Program on Tuesday, June 24 |
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Medium Hall on Tuesday, June 24 |
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Tutorial |
Time |
Duration Number |
TutorialTopics (General Review) |
Lecturers |
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Tutorial: |
Chairperson: Seiji Nagahara (ASML Japan), Teruaki Hayakawa (Institute of Science Tokyo) |
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13:00-13:05 |
5 min TU1 |
Opening remark from SPST |
Takao Watanabe (University of Hyogo) |
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13:05-13:10 |
5 min TU2 |
Opening remark from TAPJ |
Hideo Horibe (Osaka Metropolitan
University) |
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13:10-13:35 |
25 min TU3 |
History of the Semiconductor Industry and Development of Chemical Amplification Three-Component Resists |
Hideo Horibe (Osaka Metropolitan
University) |
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13:35-14:00 |
25 min TU5 |
From Visible to Extreme UV: The Evolution of Information Transfer in Semiconductor Projection Lithography |
John Peterson (imec) |
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14:00-14:20 |
20 min TU6 |
i-line resist: History and Design Principle |
Makoto Hanabata (Photofunctional Materials Research Co.,
Ltd.) |
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14:20-14:40 |
20 min |
Break |
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Chairperson: Takao Watanabe (University of Hyogo), Hideo Horibe (Osaka Metropolitan University) |
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14:40-15:10 |
30 min TU7 |
KrF/ArF/ArFi/EB/EUV Chemically Amplified Resist (CAR); (PTD, NTD, developer) |
Toru Fujimori (Hitachi High-Tech) |
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15:10-15:35 |
25 min TU8 |
Basics and Recent Advances of Photo-Acid Generators |
Tomotaka Tsuchimura (Fuji Film) |
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15:35-16:00 |
25 min TU9 |
Early Metal-Containing Resists for EUV Lithography |
Robert Brainard (SUNY) |
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16:00-16:20 |
20 min |
Break |
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Chairperson: Seiji Nagahara (ASML Japan), Toru Fujimori (Hitachi High-Tech) |
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16:20-16:40 |
20 min TU10 |
Resist filtering technology |
Toru Umeda (Nihon Pall) |
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16:40-17:10 |
30 min TU11 |
Basics of BARC, SOC, TC, MHM, rinse, shrink material |
Tomohide Katayama (Merck) |
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17:10-17:45 |
35 min TU12 |
Special Keynote Tutorial Talk:
Process technology for evolving 3D stacked CMOS image sensors |
Hayato Iwamoto (Sony Semiconductor Solutions) |
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17:45-17:50 |
5 min TU13 |
Closing remark |
Seiji Nagahara (ASML Japan) |
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17:50-18:00 |
10 min |
Break |
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Welcome Reception |
18:00-20:00 |
120 min |
Welcome Reception (Get together party) with light meals (Free of charge) |
At Foyer in front of Medium Hall |
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Program on Wednesday, June 25 |
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Medium Hall on Wednesday, June 25 |
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Symposium |
Time |
Number |
Presentation Title |
Authors |
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Opening Remarks |
9:30-9:45 |
OP |
Opening Remarks |
Takeo Watanabe |
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SPST |
9:45-10:00 |
AC |
SPST Award Ceremony |
Takeo Watanabe, SPST |
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A0. Plenary talk |
Chairperson:Takeo Watanabe (University of Hyogo), Seiji Nagahara (ASML Japan) |
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10:00-10:45 |
A00-01 |
EUV Lithography; past, present and future |
Jos Benschop |
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10:45-11:30 |
A00-02 |
EUV History, current status and prospect for EUV Lithography |
Takeo Watanabe |
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11:30-13:00 |
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Lunch |
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A3. Direct Self Assembly (DSA) |
Chairpersons: Seiji Nagahara (ASML Japan), Redouane Borsali (Polynat Carnot Institute) |
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13:00-13:40 |
A03-01 |
IR-AFM metrology on latent images in DSA and EUVL photoresist (Keynote) |
Diederik Maas 1, Maarten van Es 1, Komal Pandey 1, Adam (Chung Bin) Chuang 1, Takehiro Seshimo 2, and Teruaki
Hayakawa 3 |
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13:40-14:00 |
A03-02 |
Strategic Development of High-Chi Materials for Directed Self-Assembly |
Shota Iino, Takehiro Seshimo, Ken Miyagi, Takahiro Dazai, and Kazufumi Sato, |
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14:00-14:20 |
A03-03 |
Development of PS-PMMA Block Copolymers Incorporating Poly(n-butyl methacrylate) for Low Temperature Thermal Annealing toward Perpendicular Microdomain Alignment |
Hsi-Chih Wang 1,Takehiro Seshimo 2, Takahiro Dazai 2, Kazufumi Sato 2, Kan Hatakeyama-Sato 1, Yuta Nabae 1, and
Teruaki Hayakawa 1 |
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14:20-14:40 |
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Coffee Break |
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Chairpersons: Teruaki Hayakawa (Institute of Science Tokyo), Diederik Maas (TNO) |
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14:40-15:10 |
A03-04 |
Self-assembly of Carbohydrate Block Copolymers: From Glyconanoparticles to thin films to photonic crystals (Invited) |
Redouane Borsali |
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15:10-15:30 |
A03-05 |
The effect of side-chain modification via hydrogen bonding on the microphase-separated structure of PS-b-P4VP-b-PMMA |
Ryota Uehara 1, Shinsuke Maekawa 1, Takehiro Seshimo 2, Ryutaro Sugawara 2, Takahiro Dazai 2, Kazufumi Sato 2,
Kan Hatakeyama-Sato 1, Yuta Nabae 1, and Teruaki Hayakawa 1 |
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15:30-15:50 |
A03-06 |
Preparation of metal-containing BCP thin film |
Desheng Zhan, Zhenyu Yang, Xiaofei Qian, Guangya Wu, and Hai Deng |
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15:50-16:10 |
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Coffee Break |
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Chairpersons: Takehiro Seshimo (Tokyo Ohka Kogyo Co. Ltd.), Dustin W. Janes (TEL Technology Center, America) |
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16:10-16:30 |
A03-07 |
Synthesis of polymeric photoacid generator with sub-10nm patterning capability |
Tao Liu, Zhenyu Yang, Xiaofei Qian, and Hai Deng |
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16:30-16:50 |
A03-08 |
Solvent Annealing of Fluorine-Containing Block Copolymers to Control Orientation |
Hongyi Tang, Xuemiao Li, Xiaofei Qian, and Hai Deng |
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16:50-17:10 |
A03-09 |
Molecular assembly and disassembly of AIE-active triangular chromophores |
Pyae Thu 1, Hiroki Nakanishi 2 and Mina Han 1,2 |
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17:10-17:30 |
A03-10 |
Interactions of AIE-active silole derivatives with linear and trigonal azo chromophores |
Mina Han 1, Pyae Thu 1, Min Kyoung Kim 2, and Young Tae Park 2 |
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17:30-18:00 |
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Coffee Break (with light meals) |
At Foyer in front of Medium Hall |
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Panel |
18:00-20:00 |
PD |
Panel Discussion |
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Small Hall on Wednesday, June 25 |
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Symposium |
Time |
Number |
Presentation Title |
Authors |
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A2. Nanobiotechnology |
Chairpersons: Kensuke Osada (NIQST), Gao Shan (NIQST) |
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13:00-13:30 |
A02-01 |
Photo-responsive cell anchoring surface for single-cell phenotype analysis (Invited) |
Satoshi Yamaguchi |
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13:30-14:00 |
A02-02 |
Bio Roll-Up: Self-Assembly of Hydrogel Photoresists (Invited) |
Shaheen Hasan 1, Chase Brisbois 2, Kelly Carufe 3, Abigail Johnson 2, Julia
Garrison 2, Lauren Sfakis 2, Victoria Brunner 2, McKenzie Albrecht 4, Aishwarya Panneerselvam 2, Yubing Xie 2, and Robert Brainard 2 |
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14:00-14:20 |
A02-03 |
Photomodifiable azopolymer nanotopography for applications in cell biology |
John T. Fourkas, Mona Abdelrahman, Wolfgang Losert, Jerry Shen, Nikos Liaros, and Jeffrey Taylor |
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14:20-14:40 |
A02-04 |
Elastoplastic analysis of deformation of poly(L-lactic acid) microneedle |
Yukihiro Kanda1,2, Hiroaki Takehara1,2, and Takanori Ichiki1,2 |
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14:40-15:10 |
A02-05 |
Optimal radiation dose to induce the abscopal effect through the combination of carbon-ion radiotherapy and immune checkpoint therapy (Invited) |
Liqiu Ma 1,2, Lin Xie 1, Kensuke Osada 1, Yukari Yoshida 2, Akihisa Takahashi 2 and Takashi Shimokawa 1 |
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15:10-15:30 |
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Coffee Break |
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Chairpersons: Yukihiro Kanda (iCONM), Takanori Ichiki (Univ. of Tokyo) |
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15:30-16:00 |
A02-06 |
Lipid Nanodiscs Formed by Lipoprotein-Mimetic Polymers and Their Applications in Drug Delivery (Invited) |
Kazuma Yasuhara |
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16:00-16:30 |
A02-07 |
Nano-Sized Contrast Agent Based on a Novel Self-Folding Macromolecular Architecture for MRI-Based Cancer Diagnosis (Invited) |
Shan Gao 1, Yutaka Miura 2, Akira Sumiyoshi 1, Nobuhiro Nishiyama 2, Ichio Aoki 1 and Kensuke Osada 1 |
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16:30-16:50 |
A02-08 |
Accumulation of nanoruler polymer-based probe in the inflammaging model mice for the MRI diagnosis of chronic inflammation. |
Nanami Maehara 1, Kae Sato 2, Mitsuru Naito 3, Kanjiro Miyata 3, Akiko Takahashi 4, and Kensuke Osada 1 |
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16:50-17:10 |
A02-09 |
Evaluation of the effectiveness of exosome heterogeneous fractionation analysis using a combination of FFE and NTA |
Shusuke Sato 1, and Takanori Ichiki 1,2 |
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17:10-17:30 |
A02-10 |
Comparative Study of Piezoelectric Properties in Poly-L-Lactic Acid (PLLA) and Polyvinylidene Fluoride (PVDF) Nanofibers |
Qi Kang, Hiroaki Takehara and Takanori Ichiki |
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Room 408 on Wednesday, June 25 |
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Symposium |
Time |
Number |
Presentation Title |
Authors |
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A6. Nanoimprint |
Chairpersons: Yoshihiko Hirai (Osaka Metropolytan University), Jun Taniguchi (Tokyo University of Science) |
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12:50-13:20 |
A06-01 |
Optical polymer wafers for waveguide of AR Glasses (Invited) |
Akifumi Aono, Eiichiro Hikosaka, Takeshi Shinkai, Takashi Kasai, and Akihiro Muramatsu |
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13:20-13:50 |
A06-02 |
High Refractive Index Polymers for Advanced Photonics: Opportunities and Challenges |
C. Pina-Hernandez, K. Yamada, A. Legacy, and K. Munechika |
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13:50-14:10 |
A06-03 |
Development of TiO₂-SiO₂ radical-based gas-permeable mold for application in UV nanoimprint lithography |
Misaki Oshima1, Mayu Morita 1, Mano Ando 1, Rio Yamagishi 1, Sayaka Miura 1, Naoto Sugino 2, and Satoshi
Takei 1 |
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14:10-14:30 |
A06-04 |
Fabricating of the structure with partially different wettability incorporating the moth-eye structure and the applications |
Takuto Wakasa and Jun Taniguchi |
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14:30-14:50 |
A06-05 |
Fabrication of Rose Petal effect Surface using photosensitive polyimide and nanoimpring |
Yoritaka Danjo, and Jun Taniguchi |
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14:50-15:00 |
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Coffee Break |
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15:00-15:30 |
A06-06 |
Nanoimprinting Lithography as Permanent Imprint or Etching Mask (Invited) |
Thomas Achleitner |
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15:30-15:50 |
A06-07 |
Three-dimensional patterning technique for nanoimprint mold by dwell-time algorithms with iterative blind deconvolution method |
Noriyuki Unno, Ryunosuke Komine, Jun Taniguchi, and Shin-ichi Satake |
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15:50-16:10 |
A06-08 |
Fabrication of environmentally friendly biodegradable polylactic acid microstructures by micro-injection molding using amine-containing gas-permeable hybrid molds |
Mayu Morita 1, Misaki Oshima 1, Arisa Teramae 1, Sayaka Miura 1, Rio Yamagishi 1, Naoto Sugino 2, Yoshiyuki
Yokoyama 3, and Satoshi Takei 1, |
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16:10-16:30 |
A06-09 |
Low-Temperature Nanoimprint Lithography for Advanced Microneedles in Temperature-Sensitive Drug Delivery |
Sen Lean Goo, Rio Yamagishi, Sayaka Miura, and Satoshi Takei |
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A8. Photopolymers in 3-D Printing/ Additive Manufacturing |
Chairpersons: Takumi Ueno (Shinshu Univ.), Masaru Mukai (Tokyo Univ. of Science) |
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16:30-17:00 |
A08-01 |
Initiator-free recyclable resin available for two-photon lithography (Invited) |
Masaru Mukai, Wakana Miyadai, and Shoji Maruo |
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17:00-17:20 |
A08-02 |
Physics-based deep learning network for parallelized two-photon polymerization lithography using a spatial light modulator |
Valeriia Sedova 1, Thomas Le Deun 2, Joel Rovera 2, Jonas Wiedenmann 3,
Kevin Heggarty 2, and Andreas Erdmann 1 |
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17:20-17:40 |
A08-03 |
Photopolymers with Enhanced Thermomecanical Properties for 3D Printing Applications |
Céline Croutxé-Barghorn, Lucile Halbardier, Emile Goldbach, and Xavier
Allonas |
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Room 409 on Wednesday, June 25 |
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Symposium |
Time |
Number |
Presentation Title |
Authors |
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A12. Fundamentals and Applications of Biomimetics Materials and Processes |
Chairpersons: Atsushi Sekiguchi (LTJ), Takayuki Murosaki (Asahikawa medical Univ.) |
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13:30-13:55 |
A12-01 |
Superhydrophobic PDMS using femtosecond laser-processed surface molds for anti-icing (Invited) |
Toshimitsu Sakurai 1, Toshihiro Somekawa 2, Yuji Hirai 3, and Hiroki Matsushita 1 |
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13:55-14:15 |
A12-02 |
Antibacterial property of Si Nanopillars for anti-microbial resistance (AMR) bacteria |
Takeshi Ito 1, Yushi Yanagisawa 1, Go Yamamoto 2, Shigeo Hamaguchi 2, Satoshi Kutsuna 2, Tomohiro Shimizu 1, and
Shoso Shingubara 1 |
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Charipersons: Takayuki Murosaki (Asahikawa Medical Univ.), Fujio Tsumori (Kyushu Univ.) |
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14:15-14:35 |
A12-03 |
Development of antimicrobial adhesion-resistant surfaces by using COP nanopillar structures |
Zihao Zhao, Tomohiro Shimizu, Shoso Shingubara, and Takeshi
Ito |
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14:35-14:55 |
A12-04 |
Practical Biomimetic Frameworks with Specific Case Studies for Extracting and Applying Biological Solutions |
Satoru Tachibana |
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14:55-15:10 |
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Coffee Break |
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Chairpersons: Takeshi Ito (Kansai Univ.), Masashi Yamamoto (National Institute of Technology, Kagawa College) |
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15:10-15:30 |
A12-05 |
Wettability Control of Ceramic Surfaces with Hierarchical Nano/Micro-patterns |
Shotaro Manabe, and Fujio Tsumori |
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15:30-15:50 |
A12-06 |
Magnetically-Actuated Dynamic Culture System for Investigating Mechanical Effects on Biological Growth |
Nako Okamoto, and Fujio Tsumori |
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15:50-16:10 |
A12-07 |
High Packing Efficient Deployment Method Using Swelling Hydrogels Inspired by Out-of-Plane Biological Deformation |
Akito Nagaoka, and Fujio Tsumori |
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Chairpersons: Fujio Tumori (Kyushu Univ.), Takeshi Ito (Kansai Univ.) |
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16:10-16:30 |
A12-08 |
Analysis of barnacle exploring behavior on surfaces with different functional groups |
Takayuki Murosaki 1, Shota Asano 2, Yasuyuki Nogata 3, and Yuji Hirai 4 |
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16:30-16:50 |
A12-09 |
Effect of Oxygen Addition on the Microstructure Formation on the Surface of PMMA Plate Using Atmospheric-Pressure Low-Temperature Plasma |
Ayumu Takada 1, Motoki Tanaka 1, Atsushi Sekiguchi 2,3, and Masashi Yamamoto 1 |
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Program on Thursday, June 26 |
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Medium Hall on Thursday, June 26 |
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Symposium |
Time |
Number |
Presentation Title |
Authors |
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A5. EUV Lithography |
Chairpersons: Takeo Watanabe (Univ. of Hyogo), Danilo de Simone (imec) |
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09:00-09:30 |
A05-01 |
Current Challenges in Photoresist (Invited) |
Mark Neisser 1,2 |
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09:30-10:00 |
A05-02 |
Illuminating the demands high NA EUV will place on next generation photoresists and photomasks (Invited) |
Patrick Naulleau |
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10:00-10:20 |
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Coffee Break |
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Chairpersons: Taku Hirayama (HOYA), Mark Neisser (Tsinghua Univ.) |
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10:20-10:55 |
A05-03 |
Double-Deprotected Acids: Polymeric Esters and Acid Amplifiers (Invited) |
Seth Kruger 1, Brian Cardineau 2, William Earley, Kenji Hosoi 3,
Koichi Miyauchi 3, and Robert L. Brainard 4 |
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10:55-11:25 |
A05-04 |
Double Amplification Resists from Acid-Catalyzed Chain-Unzipping of Polyphthalaldehyde-Based Polymers (Invited) |
Rachel Snyder 1, Shintaro Yamada 1, MingQi Li 1, Kyung Hee Oh 2, Jae Hyun Kim 2, Madan Biradar 3, Gokhan Sagdic 3,
and Christopher K. Ober 3 |
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A4. Computational / Analytical Approach for Lithography Processes |
Chairpersons: Kenji Yoshimoto (Kanazawa Univ.), Sousuke Osawa (JSR) |
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11:30-12:00 |
A04-01 |
Incorporating advanced scanner models in semiconductor manufacturing (Invited) |
Wim Tel, Rob Faessen, Philipp Strack, Pieter Smorenberg, Jaap Karssenberg, Hakki Ergun Cekli, and Seiji
Nagahara |
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12:00-13:30 |
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Lunch time |
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Chairpersons: Kenji Yoshimoto (Kanazawa Univ.), Sousuke Osawa (JSR) |
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13:30-14:00 |
A04-02 |
Formulation of Developer Solutions Using Integrated Computational Approaches (Invited) |
Yuqing Jin 1, Takehiro Masuda 1, Yuko Tsutsui Ito 1, Takahiro Kozawa 1, |
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14:00-14:30 |
A04-03 |
Molecular dynamics study of early stages of development process (Invited) |
Masaaki Yasuda, Ryuki Tanaka, Kousei Tada, and Hiroto Wakamatsu |
|
|
|
14:30-14:50 |
A04-04 |
Process and material design for NIL, CMP, and resist synthesis, assisted by Machine learning |
Yoshihiko Hirai, Masaru Sasago, Jun Sekiguchi, Takeyasu Saito, and Masaaki Yasuda |
|
|
|
14:50-15:10 |
|
Coffee Break |
|
|
|
|
Chairpersons: Masaaki Yasuda (Osaka Metropolitan University), Kenji Yoshimoto (Kanazawa Univ.) |
|
||||
|
15:10-15:40 |
A04-05 |
Neural Network Molecular Dynamics Simulations on Synthesis Process of MoS2 Thin Films from Molybdenum Ditiocarbamate Molecules (Invited) |
Momoji Kubo |
|
|
|
15:40-16:00 |
A04-06 |
Modeling of interactive junction point in directed self-assembly |
Kenji Yoshimoto |
|
|
|
A7. 193 nm Lithography Extension |
Chairperson: Yoshio Kawai (Shin-Etsu Chemical) |
|
|||
|
16:10-16:30 |
A07-01 |
Development of novel PAG for thick layer photoresist application |
Won Seok Lee |
|
|
|
Banquet |
17:30-20:00 |
150 min |
Banquet with special events: (Pre-registration or on-site registration is needed) |
14F at HOTEL MONTEREY HIMEJI |
|
|
|
|
|
|||
|
Small Hall on Thursday, June 26 |
|
||||
|
Symposium |
Time |
Number |
Presentation Title |
Authors |
|
|
A9. Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices |
Chairpersons: Takumi Ueno (Shinshu Univ.), Sanjay Malik (Screen SE) |
|
|||
|
09:00-09:30 |
A09-01 |
Next Generation Chiplet Technology Development:Focusing on Fine RDL Patterning (Invited) |
Masaru Sasago |
|
|
|
09:30-10:00 |
A09-02 |
Hybrid Integration for Advanced Electronic-Photonic Packaging (Invited) |
Yuma Yoshida, Taiga Sakamoto, Masahiro Matsunaga, Takashi Kawamori, and Masayoshi Nishimoto |
|
|
|
10:00-10:30 |
A09-03 |
The Development of Novel Polymer Materials for Advanced MEMS Packaging (Invited) |
Takenori Fujiwara |
|
|
|
10:30-10:40 |
|
Coffee Break |
|
|
|
|
Chairpersons: Guillermo Fernandez Zapico (TSMC Japan), Hitoshi Araki (Toray) |
|
||||
|
10:40-11:30 |
A09-04 |
Creating Innovation for Sustainable World in Partnership with Semiconductor Eco System (Keynote) |
Takumi Mikawa |
|
|
|
11:30-11:50 |
A09-05 |
Digital Lithography for SWIR Applications Facilitated by Patterning of Novel IR–Pass Resists |
Ksenija Varga 1, Lisa Berger 1, Tobias Zenger 1, Boris Považay 1, Hirotaka Takishita 2, Yoshiki Takahashi 2,
Yoshinori Taguchi 2, Johannes Koch 3, and Matthias Schicke 3 |
|
|
|
11:50-12:10 |
A09-06 |
Rheological properties of resin films containing a polymethacrylate having a urea moiety |
Hiroshi Matsutani 1, Masahiro Aoshima 1, Kenji Tanaka 1, Bao Li 1, Akitoshi Tanimoto 1, Yasuharu Murakami 1, Xiaodong
Ma 2, and Xuesong Jiang 2 |
|
|
|
12:10-14:00 |
|
Lunch |
|
|
|
|
Chairpersons: Sanjay Malik (Screen SE), Masayoshi Nishimoto (Resonac) |
|
||||
|
14:00-14:30 |
A09-07 |
Carrier warpage improvement using non-photosensitive dielectric material for high I/O density organic RDL (Invited) |
Guillermo Fernández |
|
|
|
14:30-15:00 |
A09-08 |
Development of Negative-tone Photosensitive Dielectric Materials for Fine Pitch RDL in Chiplet Integration (Invited) |
Toshiyuki Ogata |
|
|
|
15:00-15:30 |
A09-09 |
Atomic-level analysis of Cu/polyimide interface under high temperature storage and the investigation of adhesion degradation mechanism (Invited) |
Yugo Kubo |
|
|
|
15:30-15:40 |
|
Coffee Break |
|
|
|
|
Chirpersons: Ksenija Varga (EV Group), Hitoshi Araki (Toray) |
|
||||
|
15:40-16:30 |
A09-10 |
Crack Resistance Evaluation Method of Photoimageable Dielectrics for Redistribution Layer |
Kenichi Takeuchi, Chiharu Koga, Tomoaki Shibata, Yu Aoki, and Yukika Aoki |
|
|
|
16:00-16:20 |
A09-11 |
Enhanced Inductors and Balun Transformers Performance for 5G-6G Applications with Patterned Magnetic Materials with Special Rinse Solution |
Seiya Masuda, Tetsushi Miyata, Hiroaki Idei, Shota Oi, Hiroyuki Suzuki, and Hidenori Takahashi |
|
|
|
16:20-16:40 |
A09-12 |
Development of a Novel Negative-Tone Dry Film Resist with PVA Layer for Wiring with 1.5/1.5 µm Line/Space (Invited) |
Natsuki Toda, Kei Togasaki, Kensuke Yoshihara, Yosuke Kaguchi, Ayane Mochizuki, Kanako Funai, Hitoshi Onozeki,
and Kenichi Iwashita |
|
|
|
Banquet |
17:30-20:00 |
150 min |
Banquet with special events: (Pre-registration or on-site registration is needed) |
14F at HOTEL MONTEREY HIMEJI |
|
|
|
|
|
|
|
|
|
|
|
|
|||
|
Room 408 on Thursday, June 26 |
|
||||
|
Symposium |
Time |
Number |
Presentation Title |
Authors |
|
|
B2 (Japanese). Plasma Photochemistry and Functionalization of Polymer Surfaces |
Chairperson: Tatsuyuki Nakatani (Okayama Univ. of Sci.) |
|
|||
|
09:30-09:50 |
B02-01 |
Time Dependence of On the Absorption Spectra of Indigo Carmine Solution |
Yuki Jonen 1, Yamato Torii 1, Hirofumi Kurita 2, Tatsuru Shirafuji 1, and Jun-Seok Oh 1 |
|
|
|
09:50-10:10 |
B02-02 |
Electrical and Optical Characteristics of Atmospheric-Pressure Nitrogen Plasma Using a Micro Hollow Array Electrode |
Fumiya Taniguchi 1, Keishi Yanai 1,2, Tatsuru Shirafuji 1, and Jun-Seok Oh 1 |
|
|
|
10:10-10:30 |
B02-03 |
Modulating the Concentrations of Reactive Oxygen and Nitrogen Species in Plasma-activated Water Using Dielectric Barrier Discharge with Various Gases |
Soma Hosoi 1, Naoki Azuma 1, Sushil Kumar KC 2, Endre J. Szili2, Akimitsu Hatta 3, Tatsuru Shirafuji 1, and
Jun-Seok Oh 1 |
|
|
|
10:30-10:50 |
B02-04 |
Modification of Polymer Surface Using Ozone |
Hiroto Mori 1, Kohei Yamashita 1, Tatsuru Shirafuji 1, Jun-Seok Oh 1, and Akimitsu Hatta 2 |
|
|
|
10:50-11:00 |
|
Coffee Break |
|
|
|
|
Chairperson: Jun-Seok Oh (Osaka Metropolitan University) |
|
||||
|
11:00-11:20 |
B02-05 |
RF-PECVD法により成膜されたDLC膜へのスペクトルデータ駆動科学の適用 |
小佐野 芳寿 1,2, 中谷 達行 1,3 |
|
|
|
11:20-11:40 |
B02-06 |
圧力勾配型スパッタ法がDLC膜の成膜と膜特性に及ぼす影響 |
米澤 健 1,2, 小佐野 芳寿 1, 中谷 達行 1,3 |
|
|
|
11:40-12:00 |
B02-07 |
疎水性鎖にピリジル基を有する両親媒性ブロック共重合体の構築とそのpH応答性高分子ミセルへの応用 |
近藤 伸一1, 土井 直樹1, 笹井 泰志2, 山内 行玄3 |
|
|
|
Banquet |
17:30-20:00 |
150 min |
Banquet with special events: (Pre-registration or on-site registration is needed) |
14F at HOTEL MONTEREY HIMEJI |
|
|
|
|
|
|
|
|
|
|
|
|
|||
|
Room409 on Thursday, June 26 |
|
||||
|
Symposium |
Time |
Number |
Presentation Title |
Authors |
|
|
B3-5(Japanese) |
Chairpersons: Hideo Horibe (Osaka Metropolitan University), Masashi Yamamoto (Kagawa KOSEN) |
|
|||
|
10:00-10:20 |
B03-01 |
レーザーを用いたレジスト剥離における走査照射条件の最適化 |
森下 沙夢 1, 面地 和樹 1, 安國 良平 1, 吉村 政志 2, 山本 竜也 3, 堀邊 英夫 3, 神村 共住 1,2 |
|
|
|
10:20-10:40 |
B03-02 |
回転円盤上における二流体ジェット噴射によって形成された液膜構造 |
池ヶ谷 充貴也 1, 土居 尚人 1, 高橋 広毅 2, 今井 正芳 2, 真田 俊之 1 |
|
|
|
10:40-11:05 |
B03-03 |
マイクロ波励起水蒸気プラズマアッシングプロセスにおける基板ホルダへのRFバイアス電圧印加効果 (Invited) |
石島達夫 |
|
|
|
11:05-11:15 |
|
Coffee Break |
|
|
|
|
Chairpersons: Tatsuo Ishijima (Kanazawa Univ.), Toshiyuki Sanada (Shizuoka Univ.) |
|
||||
|
11:15-11:35 |
B03-04 |
三成分化学増幅型感光性ポリイミドにおけるカルボン酸型溶解抑制剤による感度と解像度の向上 |
Daiki Madokoro 1, Katsuaki Takashima 1, Kohei Yamaoka 2, Susumu Tanaka 2, Tomoyuki Yuba 2, and Hideo Horibe 1 |
|
|
|
11:35-11:55 |
B03-05 |
３成分化学増幅型ノボラックレジストにおける溶解抑制剤の脱保護活性化エネルギーの評価（２） |
井東七ツ希, 間所大貴, 髙嶋克彰, 堀邊英夫 |
|
|
|
11:55-12:15 |
B03-06 |
3成分化学増幅型レジストにおける溶解抑制剤の化学構造とレジスト特性との関係 |
嶋田野乃佳, 髙嶋克彰, 堀邊英夫 |
|
|
|
A13 & B1(Japanese) |
Chairperson: Teruaki Hayakawa (Institute of Science Tokyo) |
|
|||
|
13:00-13:30 |
B01-01 |
Nonstoichiometric Step-Growth Polymerization Based on Intramolecular Catalyst Transfer System (Invited) |
Tomoya Higashihara |
|
|
|
13:30-13:50 |
A13-01 |
Highly Reliable Polyimide-based Thermal Interface Material Sheet for Power Modules |
Hiroki Mori, Yohei Sakabe, and Akira Shimada |
|
|
|
Chairperson: Hitoshi Araki (Toray) |
|
||||
|
13:50-14:10 |
A13-02 |
Synthesis of Low Dielectric Poly(esterimide)s Incorporating Double-Decker Silsesquioxane Units |
Natsuko Sashi, Erina Yoshida, Hayato Maeda, Kan Hatakeyama-Sato, Yuta Nabae, Ririka Sawada, Shinji Ando, and
Teruaki Hayakawa |
|
|
|
14:10-14:20 |
|
Coffee Break |
|
|
|
|
14:20-14:40 |
A13-03 |
Synthesis and Dielectric Properties of Silicon-Containing Hydrocarbon-Based Polymers via Hydrosilylation Polymerization |
Yuka Azuma, Riku Takahashi, Kan Hatakeyama-Sato, Yuta Nabae, and Teruaki Hayakawa |
|
|
|
14:40-15:00 |
A13-04 |
Synthesis and Dielectric Properties of Poly(phenylene ether) Bearing Bulky Side Chains |
Kentaro Sone, Hayato Maeda, Kan Hatakeyama-Sato, Yuta Nabae, and Teruaki Hayakawa |
|
|
|
Chairperson: Kenji Miyao (Sumitomo Bakelite) |
|
||||
|
15:00-15:20 |
A13-05 |
Influence of alkyl length on the morphology and higher-order structure of poly(amic acid) flower-like particles |
Yuqian Chen, Kan Hatakeyama-Sato, Yuta Nabae, and Teruaki Hayakawa |
|
|
|
15:20-15:40 |
A13-06 |
Synthesis of Negative-Type Photosensitive Polyimides Using 2-Hydroxyethyl Methacrylate as a Crosslinking Agent and their Dielectric Constant and Dielectric Loss Tangent. |
Koki Matsuo 1, Hayato Maeda 1, Riku Takahashi 1, Makiko Irie 2, Kazuaki Ebisawa 2, Kan Hatakeyama-Sato 1, Yuta
Nabae 1, and Teruaki Hayakawa 1 |
|
|
|
15:40-16:00 |
A13-07 |
Synthesis and Characterization of an Epoxy Monomer with Six Epoxy Groups and its Thermosetting Resin |
Takahisa Hiramatsu, Rika Marui, Kan Hatakeyama-Sato, Yuta Nabae, and Teruaki Hayakawa |
|
|
|
Banquet |
17:30-20:00 |
150 min |
Banquet with special events: (Pre-registration or on-site registration is needed) |
14F at HOTEL MONTEREY HIMEJI |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
Program on FRIday, June 27 |
|
||||
|
|
|||||
|
Medium Hall on Friday, June 27 |
|
||||
|
Symposium |
Time |
Number |
Presentation Title |
Authors |
|
|
A5. EUV Lithography |
Chairpersons: Takeo Watanabe (Univ. of Hyogo), Ethan Choong Bong Lee (Samsung SDI) |
|
|||
|
09:00-09:30 |
A05-05 |
Patterning materials in the era of high NA EUV Lithography (Invited) |
Danilo De Simone |
|
|
|
09:30-10:00 |
A05-06 |
EUV-FEL as a future light source for advanced lithography (Invited) |
Hiroshi Kawata, Yosuke Honda, Norio Nakamura, Ryukou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yoshinori Tanimoto,
Miho Shimada, Masahiro Yamamoto, Takanori Tanikawa, Olga Tanaka, Takashi Obina, Shinichiro Michizono |
|
|
|
10:00-10:30 |
A05-07 |
New Activity of EUV Light Source for Semiconductor Manufacturing in Kyushu-University (Invited) |
Yukihiko Yamagata 1, Hakaru Mizoguchi 1,2, Kentaro Tomita 3, Daisuke Nakamura 1, Takeshi Hi-gashiguchi 4, Atsushi
Sunahara 5, Katsunobu Nishihara 6, Takashi Toshima 2, Hiroki Kondo 1, Takuji Sakamoto 2, Tanemasa Asano 2 and Masaharu Shiratani 1,2 |
|
|
|
10:30-10:50 |
|
Coffee Break |
|
|
|
|
Chairpersons: Hiroto Kudoh (Kansai Univ.), Patrick Naulleau (EUV Tech) |
|
||||
|
10:50-11:10 |
A05-08 |
Development of Beyond EUV Interference Lithography tool at NewSUBARU |
Ryuta Shiga, Shinji Yamakawa, and Tetsuo Harada |
|
|
|
11:10-11:30 |
A05-09 |
Evaluation of Resists Exposed using sub-200 eV Electron Beam towards Beyond-EUV Lithography. |
Ryuichi Yamasaki, Shinji Yamakawa, and Tetsuo Harada |
|
|
|
11:30-12:00 |
A05-10 |
Resist imaging by laser-based photoemission electron microscopy (Invited) |
Toshiyuki Taniuchi |
|
|
|
12:00-12:20 |
A05-11 |
Acquisition of micron-scale chemical mapping image of resist by PEEM |
Shinji Yamakawa, Tsukasa Sasakura, and Tetsuo Harada |
|
|
|
12:20-14:00 |
|
Lunch |
|
|
|
|
Chairpersons: Shinji Yamakawa (Univ. of Hyogo), Robert Brainard (SUNY) |
|
||||
|
14:00-14:30 |
A05-12 |
Inspection of next generation hybrid EUV resists with NP-SIMS (Invited) |
Gregrey Swieca 1, Won-Il Lee 2, Shixian Ha 2, Nikhil Tiwale 3, Chang-Yong
Nam 2,3, and Michael J. Eller 1 |
|
|
|
14:30-15:00 |
A05-13 |
Characterization of latent image of photoresist via critical-dimension resonant soft X-ray scattering (Invited) |
Qi Zhang, Kas Andrle, Weilun Chao, Zhengxing Peng, Warren Holcomb, Ryan
Miyakawa, Dinesh Kumar, Alexander Hexemer, Patrick Naulleau, Bruno La Fontaine, Ricardo Ruiz, and Cheng Wang |
|
|
|
15:00-15:20 |
A05-14 |
Nanoscale resist pattern defects clustered in the micron region found by soft X-ray microscopy |
Takeharu Motokawa 1, Shuhei Iguchi 2, |
|
|
|
15:20-15:40 |
|
Coffee Break |
|
|
|
|
Chairpersons: Sousuke Oosawa (JSR), Michael Eller (California State Univ.) |
|
||||
|
15:40-16:00 |
A05-15 |
Evaluation of Inorganic-organic Hybrid Resist Materials with ultrafast coherent high harmonic generation (HHG) EUV system developed in QST |
Hiroki Yamamoto, Thanh-Hung Dinh, and Masahiko Ishino |
|
|
|
16:00-16:20 |
A05-16 |
Multi-Trigger Resists: Modeling and Simulation Results |
Thiago J. dos Santos 1, Andreas Erdmann 1, Alex P. G. Robinson 2, 3, Alexandra McClelland 2, Carmen Popescu 2, Bernardo
Oyarzún 4, Joost van Bree 4, and Mark van de Kerkhof 4 |
|
|
|
16:20-16:40 |
A05-17 |
PFAS-free rinse materials for pattern collapse mitigation in EUV lithography |
Raymond Jin, Kazuma Yamamoto, Naoki Matsumoto, Maki Ishii, Miho Yamaguchi, Yusuke Hama, and Takuo Endo |
|
|
|
Closing |
16:45-16:55 |
CR |
Closing Remarks |
Takeo Watanabe |
|
|
|
|
|
|||
|
|
|
|
|||
|
Small Hall on Friday, June 27 |
|
||||
|
Symposium |
Time |
Number |
Presentation Title |
Authors |
|
|
A10. Chemistry for Advanced Photopolymer Science |
Chairpersons: Haruyuki Okamura (Osaka Metropolitan Univ.), Zhiquan Li (Guangdong Univ. Technol.) |
|
|||
|
13:00-13:25 |
A10-01 |
Breaking boundaries of photoinitiators: new ways to improve the reactivity of radical photopolymerization (Invited) |
Xavier Allonas |
|
|
|
13:25-13:45 |
A10-02 |
A Predictive Model for Polymerization Shrinkage Stress Derived from Photocuring Kinetics |
Gaoxiang Luo, Yusuke Hiejima, and Kentaro Taki |
|
|
|
13:45-14:05 |
A10-03 |
In-situ investigation of as-cast homopolymer-based resists |
Markus Langner 1, Gregrey Swieca 1, Won-Il Lee 2, Shixian Ha 2, Nikhil Tiwale 3, Chang-Yong Nam 2,3, and Michael J.
Eller 1 |
|
|
|
14:05-14:25 |
A10-04 |
Machine Learning-Assisted Dissolution Behavior Investigation of ArF Lithographic Materials |
Xia Lin 1, Xiyan Dong 2, Haofan Ji 1, Yuhua Li 1, Yisong Huo 1, Wei Li 1,
Liwen Mu 2, Xiaohua Lu 2, and Ruzhi M Zhang 1 |
|
|
|
14:25-14:40 |
|
Coffee Break |
|
|
|
|
Chairpersons: Kentaro Taki (Kanazawa Univ.), Xavier Allonas (Univ. Haute Alsace) |
|
||||
|
14:40-15:05 |
A10-05 |
NIR induced anionic photopolymerization based on upconversion photochemistry (Invited) |
Quanping Xie, Yaoxin Huang, Pin Yang, and Zhiquan Li |
|
|
|
15:05-15:25 |
A10-06 |
Interference of Photobase generators on Covalent Bond Exchanges in Vinylogous Urea Vitrimers |
Kanji Suyama 1, Hirokazu Hayashi 2, and Hideki Tachi 2 |
|
|
|
15:25-15:45 |
A10-07 |
Relationship between photochemical properties of oxime esters and their efficiency as photoinitiators for free radical induced photopolymerization |
Arthur Guenan1, Xavier Allonas 1, L. Feiler 2, R. Frantz 3, and Céline Croutxé-Barghorn 1 |
|
|
|
15:45-16:05 |
A10-08 |
Photocured Blended Films of Diarylfluorene having Naphthalene Moieties and TiO2 with High Refractive Indices |
Haruyuki Okamura 1, Keiko Minokami 2, and Shinsuke Miyauchi 2 |
|
|
|
|
|
|
|||
|
|
|
|
|||
|
Room 408 on Friday, June 27 |
|
||||
|
Symposium |
Time |
Number |
Presentation Title |
Authors |
|
|
A11. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices |
Chairpersons: Itaru Osaka (Hiroshima Univ.), Hideo Ohkita (Kyoto Univ.) |
|
|||
|
09:00-09:35 |
A11-01 |
Design of low complexity active materials for photovoltaic applications (Keynote) |
Martin Heeney |
|
|
|
09:35-10:00 |
A11-02 |
Development of Fused-Ring Acceptors for Green-Light Wavelength-Selective Organic Solar Cells (Invited) |
Seihou Jinnai, Yuto Shiono, and Yutaka Ie |
|
|
|
10:00-10:15 |
A11-03 |
A Strategically Designed Easily-Synthesized Polymer Donor for Efficient Organic Photovoltaics |
Kodai Yamanaka, Tsubasa Mikie, Itaru Osaka |
|
|
|
10:15-10:25 |
|
Coffee Break |
|
|
|
|
Chairpersons: Itaru Osaka (Hiroshima Univ.), Hideo Ohkita (Kyoto Univ.) |
|
||||
|
10:25-10:50 |
A11-04 |
Charge Accumulation Behavior and Persistent Luminescence in Organic Materials (Invited) |
Ryota Kabe |
|
|
|
10:50-11:15 |
A11-05 |
Organic/Hybrid Thermoelectric Materials and Devices (Invited) |
Cheng-Liang Liu, |
|
|
|
11:15-11:30 |
A11-06 |
Fabrication of Organic Field Effect Transistor Using Low Temperature Annealed Fluorinated Block Copolymer |
Tangjun Zhang, Xiaofei Qian, and Hai Deng |
|
|
|
11:30-12:50 |
|
Lunch |
|
|
|
|
Chairpersons: Itaru Osaka (Hiroshima Univ.), Hideo Ohkita (Kyoto Univ.) |
|
||||
|
12:50-13:15 |
A11-07 |
Synthesis and Photovoltaic Properties of Non-Fullerene Acceptors with Quinoxaline-Based Central Unit (Invited) |
Tomokazu Umeyama, Kaho Yasuzato, Seiya Sugiura, Kenta Yamada, Jun-ichi Inamoto, Shunjiro Fujii, and Wataru
Suzuki |
|
|
|
13:15-13:40 |
A11-08 |
Influence of Vibronic Interactions on Charge Transfer Excitons in Nonfullerene Organic Photovoltaics (Invited) |
Azusa Muraoka |
|
|
|
13:40-14:05 |
A11-09 |
ESR analysis of charge-transporting materials in non-fullerene organic solar cells (Invited) |
Atsushi Sato, and Kazuhiro Marumoto |
|
|
|
14:05-14:15 |
|
Coffee Break |
|
|
|
|
Chairpersons: Itaru Osaka (Hiroshima Univ.), Hideo Ohkita (Kyoto Univ.) |
|
||||
|
14:15-14:40 |
A11-10 |
Enhancement of Organic Solar Cell Efficiency via Incorporation of Lead Sulfide Quantum Dots (Invited) |
Qing Shen, Kei Takahashi, Yuyao Wei, Taro Toyoda, and Shuzi Hayase |
|
|
|
14:40-15:05 |
A11-11 |
Charge carrier dynamics at lead halide perovskite (Invited) |
Yasuhiro Tachiana 1,2 |
|
|
|
15:05-15:20 |
A11-12 |
Charge Transfer at the PEDOT:PSS/Perovskite Interface in RP Sn Perovskite Solar Cells Elucidated by Operando ESR Spectroscopy |
Yizhou Chen, Seira Yamaguchi, Atsushi Sato, Kaito Inoue, and Kazuhiro Marumoto |
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15:20-15:30 |
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Coffee Break |
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Chairpersons: Itaru Osaka (Hiroshima Univ.), Hideo Ohkita (Kyoto Univ.) |
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15:30-15:55 |
A11-13 |
Chlorine-mediated organic conjugated materials and quasi-planar heterojunction devices (Invited) |
Feng He |
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15:55-16:20 |
A11-14 |
Molecular Orientation and Structure Controls from Film Surface for Organic Electronics (Invited) |
Keisuke Tajima |
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16:20-16:45 |
A11-15 |
Development of Efficient Porphyrin Sensitizers for Dye-Sensitized Solar Cells Using Copper Redox Shuttles (Invited) |
Tomohiro Higashino |
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Room 409 on Friday, June 27 |
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Symposium |
Time |
Number |
Presentation Title |
Authors |
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B3. General Scopes of Photopolymer Science and Technology |
Chairperson: Teruaki Hayakawa (Institute of Science Tokyo) |
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09:00-09:20 |
B03-07 |
Glycidyl Methacrylate-Grafted Polysilanes: Synthesis and Properties |
Yukihito Matsuura 1, Sakino Kikuchi 1, and Tomoharu Tachikawa 2 |
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09:20-09:40 |
B03-08 |
アゾベンゼン系分子ガラス微粒子のヒドロキシプロピルセルロースハイドロゲル中におけるキラルフォトメカニカル挙動 |
青松義貴 1、大背戸豊 2、倉賀野正弘 1、徳樂清孝 1、中野英之 1 |
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09:40-10:00 |
B03-09 |
三つのシアノスチルベン骨格を有する新規アモルファス分子蛍光体を用いる発光パターン形成 |
島崎唯人、中野英之 |
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10:00-10:20 |
B03-10 |
ヒドロキシピリジル基を導入したメタクリル光接着材料の作製 |
古谷 昌大、松井 実玖 |
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10:20-10:40 |
B03-11 |
チオキサントン骨格並びにα–解裂型骨格を有する複合型光ラジカル重合開始剤 |
宮川 信一、小林 彪真 |
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