Call for papers ICPST-41 (2024) .
The 41st International Conference of Photopolymer Science and Technology
Materials & Processes for Advanced Lithography,
Nanotechnology and Phototechnology
June 25 (Tue) - 28 (Fri), 2024
Sponsored by the Society of Photopolymer Science and Technology (SPST)
In Cooperation with
The Technical Association of Photopolymers, Japan
The Chemical Society of Japan
The Society of Polymer Science, Japan
Endorsed by
The Japan Society of Applied Physics
Introduction
The 41st International Conference of Photopolymer Science and Technology, Materials & Processes for Advanced Lithography, Nanotechnology and Phototechnology (ICPST-41) organized by SPST will be held at International Conference Hall, Makuhari Messe, Chiba, Japan, June 25-28, 2024.
The details will appear at the SPST Homepage.
All the contributors of papers on the scientific progress and the technical development of photopolymers are cordially invited.
Scopes
The conference covers a wide range of topics relevant to photopolymer science and technology in the following fields:
A. English Symposia
A0. Plenary Talk
A1. Next Generation Lithography, EB Lithography and Nanotechnology
A2. Nanobiotechnology
A3. Directed Self Assembly (DSA)
→Self-Assembly Materials and Processes (DSA, BCP, SAM, ASD, Infiltration, Nanostructured Materials, Advanced Devices using Self Assembly, etc.)
A4. Computational / Analytical Approach for Lithography Processes
A5. EUV Lithography
A6. Nanoimprint
A7. 193 nm Lithography Extension
A8. Photopolymers in 3-D Printing/ Additive Manufacturing
A9. 2D and Stimuli Responsive Materials for Electronics & Photonics
A10. Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices
A11. Chemistry for Advanced Photopolymer Science
A12. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
A13. Fundamentals and Applications of Biomimetics Materials and Processes
A14. Polyimides and High Thermally Stable Resins -Functionalization and Practical Applications-
A15. General Scopes of Photopolymer Science and Technology
P. Panel Symposium
B. Japanese Symposia
B1. Polyimides and High Thermally Stable Resins -Functionalization and Practical Applications-
B2. Plasma Photochemistry and Functionalization of Polymer Surfaces
B3. General Scopes of Photopolymer Science and Technology
Language and Oral Presentation Time
English is used for presentations in English Symposia and Panel Symposium. Japanese and English are used for presentations in Japanese Symposia. Each presentation will not be longer than 20 minutes including discussion except for the notified lectures.
Deadline of Application to Scientific Program
February 14 (Wed), 2024.
Application to Scientific Program
Apply to [Conference → Paper Title Submission] at the SPST Homepage (https://www.spst-photopolymer.org/) before February 14, 2024.
Deadline of Submission of Papers
April 1 (Mon), 2024.
Papers
Papers submitted to ICPST-41 are published in Journal of Photopolymer Science and Technology, Vol. 37 (2024) after reviewing on the Journal's standard. Journal will be distributed to each participant during the conference. Preparation of manuscripts for the Journal should be followed to "Instructions to Authors" and "Manual for Manuscript Writing". Refer “Page Layout Sample” and use “Sample Manuscript (Manuscript Template)”. Submit the manuscripts to [Journal → Submission & Reviewing of MS] at the SPST Homepage before April 1, 2024. The Journal will be published and mailed before ICPST-41.
Editorial Office
Assoc. Prof. Haruyuki Okamura
Journal of Photopolymer Science and Technology,
Department of Applied Chemistry, Osaka Metropolitan University, 1-1 Gakuen-cho, Naka-ku, Sakai, Osaka 599-9531, Japan
Phone: +81-72-254-9291 Fax: +81-72-254-9291
E-mail: okamura(at)omu.ac.jp
Deadline of Registration for Participants
Registration for Participants
All the participants including speakers are requested to register in [Conference → Registration] at the SPST Homepage.
By May 31, 2024.
Registration fee of whole conference is ￥65,000 yen for Participants.
Registration fee of whole conference is ￥10,000 yen
for Students.
From June 1, 2024.
Registration fee of whole conference is ￥80,000 yen for Participants.
Registration fee of whole conference is ￥15,000 yen for Students.
Banquet ￥5,000
※In consideration of the recent rise in prices and ongoing operations, SPST has decided to raise the membership fee.
We recommend that you register by the end of May.
Conference Office
The 41st International Conference of Photopolymer Science and Technology (ICPST-41)
c/o Prof. Hiroto Kudo
Department of Applied Chemistry
Department of Chemistry and Materials Engineering,
Kansai University
3-3-35, Yamate-cho, Suita-shi, Osaka, 564-8680, Japan
Phone: +81-6-6368-1977, Fax: +81-6-6368-1977
E-mail: kudoh(at)kansai-u.ac.jp
The Society of Photopolymer Science and Technology (SPST)
President: Takeo Watanabe
Vice President: Teruaki Hayakawa
Director of Scientific Program: Teruaki Hayakawa
Director of Publication: Hiroyuki Mayama
Director of Awards: Itaru Osaka
Director of Administration: Hiroto Kudo
Auditor: Takumi Ueno
ICPST-41 International Advisory Board
Danilo De Simone (Belgium)
Sanjay Malik (USA)
Patrick Naulleau (USA)
ICPST-41 Organizing Committee
Chairperson: Takeo Watanabe
Members: Minoru Tsuda, Masataka Endo, Takanori Ichiki, Kouhei Soga, Seiji Nagahara, Teruaki Hayakawa, Takehiro Sejimo, Tomoki Nagai, Hiroto Kudo, Taku Hirayama, Shinji Yamakawa, Yoshihiko Hirai, Jun Taniguchi, Kazuma Kurihara, Yoshio Kawai, Wang Yueh, Robert Allen, Takumi Ueno, Shuhei Seki, Takashi Yamashita, Kuniharu Takei, Takashi Karatsu, Haruyuki Okamura, Akinori Shibuya, Hideo Ohkita, Itaru Osaka, Hiroyuki Mayama, Jun Sekiguchi, Takayuki Murosaki, Hitoshi Araki, Takashi Hirano, Shin-ichi Kondo, Hideo Horibe, Masashi Yamamoto
