Call for papers ICPST-39 (2022) ONLINE MEETING .


Japanese

The 39th International Conference of Photopolymer Science and Technology

Materials & Processes for Advanced Lithography,

Nanotechnology and Phototechnology

 

June 27 (Mon) - 30 (Thu), 2022

Online Meeting

 

Sponsored by the Society of Photopolymer Science and Technology (SPST)

  In Cooperation with

The Technical Association of  Photopolymers, Japan

The Chemical Society of Japan

The Society of Polymer Science, Japan

 

  endorsed by

       The Japan Society of Applied Physics

 

Introduction

The 39th International Conference of Photopolymer Science and Technology, Materials & Processes for Advanced Lithography, Nanotechnology and Phototechnology (ICPST-39) organized by SPSTwill be held online live meeting in the period of June 27 – 30, 2022 because of the COVID-19 pandemic.

 

All the contributors of papers on the scientific progress and the technical development of photopolymers are cordially invited.

 

Conference URL to participate will be sent to the registered email address individually after the registration and payment are completed.

 

 

Scopes

The conference covers a wide range of topics relevant to photopolymer science and technology in the following fields:

 

A. English Symposia

       

A1.    Next Generation Lithography, EB Lithography and Nanotechnology

A2.    Nanobiotechnology

A3.    Directed Self Assembly (DSA)

A4.    Computational / Analytical Approach for Lithography Processes

A5.    EUV Lithography

A6.    Nanoimprint

A7.    193 nm Lithography Extension and EUV HVM Readiness

A8.    Photopolymers in 3-D Printing / Additive Manufacturing

A9.    2D and Stimuli Responsive Materials for Electronics & Photonics

A10.  Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices

A11.  Chemistry for Advanced Photopolymer Science

A12.  Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices

A13.  Fundamentals and Applications of Biomimetics Materials and Processes

A14.  General Scopes of Photopolymer Science and Technology

 

P1.    Panel Symposium “EUV Lithography toward 10 nm and below – Prospect of Achievement for Both Highly Sensitive and low LWR EUV Resist “

 

B. Japanese Symposia

 

B1.    Polyimides and High Temperature Polymers  -Functionalization and Practical Applications-

B2.    Plasma Photochemistry and Functionalization of Polymer Surfaces

B3.    General Scopes of Photopolymer Science and Technology 

 

Language and Oral Presentation Time

 

English is used for presentations in English Symposia and Panel Symposium. Japanese and English are used for presentations in Japanese Symposia. Each presentation will not be longer than 20 minutes including discussion except for the notified lectures. 

 

 

Deadline of Application to Scientific Program

January 20 (Thu) (00:00, JST) - February 14 (Mon) (23:59, JST), 2022.

Application to Scientific Program

 

Apply to [Conference → Presentation-Information Submission] at the SPST Homepage (https://www.spst-photopolymer.org/) before February 14, 2022.

   

 

Deadline of Submission of Papers

April 1 (Fri), 2022

Papers

Papers submitted to ICPST-39 are published in Journal of Photopolymer Science and Technology, Vol. 35 (2022) after reviewing on the Journal's standard. Journal will be distributed to each participant during the conference. Preparation of manuscripts for the Journal should be followed to "Instructions to Authors" and "Manual for Manuscript Writing". Refer “Page Layout Sample” and use “Sample Manuscript (Manuscript Template)”. Submit the manuscripts to [Journal → Submission & Reviewing of MS] at the SPST Homepage before April 1, 2022. The Journal will be published and mailed before ICPST-39.

 

 

Editorial Office

Assoc. Prof. Hiroyuki Mayama

Journal of Photopolymer Science and Technology,

Department of Chemistry, Asahikawa Medical University,

2-1-1 Midorigaoka-Higashi, Asahikawa, 078-8510, Japan

Phone  +81-166-68-2726      Fax  +81-166-68-2782

E-mail  mayama@asahikawa-med.ac.jp

 

 

 

Deadline of Registration for Participants

February 1 (Tue) (00:00, JST) - June  26(Sun) (23:59, JST), 2022

Registration for Participants

All the participants including speakers are requested to register in [Conference → Registration] at the SPST Homepage before June 30, 2022.

Registration fee of whole conference is ¥35,000 yen for Participants.

Registration fee of whole conference is ¥10,000 yen for Students.

 

 

Conference Office

The 38th International Conference of Photopolymer Science and Technology (ICPST-38)    

c/o Prof. Takashi Karatsu, 

Department of Applied Chemistry

Chiba University

1-33 Yayoicho, Inage, Chiba 263-8522, Japan

Phone +81-43-290-3366  Fax +81-43-290-3401

e-mail office@spst-photopolymer.org

 

 

 

The Society of Photopolymer Science and Technology (SPST)

President:                                            Minoru Tsuda

Director of Administration:               Takashi Karatsu

Director of Scientific Program:        Masayuki Endo

Director of Publication:                     Hiroyuki Mayama

Director of International Affairs:     Takeo Watanabe

                                                       

ICPST-39 International Advisory Board

Danilo De Simone (Belgium)

Sanjay Malik (USA)

Patrick Naulleau (USA)

Yusuf Yagci (Turkey)

 

ICPST-39 Organizing Committee

Chairperson: Minoru Tsuda

Committee Members: R. Allen, H. Araki, T. Azuma, M. Endo, T. Hayakawa, Y. Hirai, T. Hirano, T. Hirayama, H. Horibe, T. Ichiki, M. Kakimoto,T. Karatsu, Y. Kawai, S. Kondo, H. Kudo, M. Kuzuya, H. Mayama, J. Mizuno, S. Nagahara, T. Nagai, T. Nishino, H. Ohkita, Y. Ohnishi, H. Oizumi, H. Okamura, I. Osaka, S. Seki, A. Sekiguchi, T. Seshimo, A. Shibuya, K. Soga, J. Taniguchi, K. Takei, T. Ueno, T. Watanabe, T. Yamashita, W. Yueh, S. Yamakawa

ICPST-38 Program Committee, Chairperson: Masayuki Endo

Local Committee, Chairperson: Takashi Karatsu

 

 

 

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