Call for Papers for ICPST-34 (2017)
The 34th International Conference of Photopolymer Science and Technology
Materials & Processes for Advanced Microlithography,
Nanotechnology and Phototechnology
June 26 - 29, 2017
International Conference Hall
Makuhari Messe, Chiba, Japan
Sponsored by the Society of Photopolymer Science and Technology (SPST)
In Cooperation with
The Technical Association of Photopolymers, Japan
The Japan Society of Applied Physics
The Chemical Society of Japan
The Society of Polymer Science, Japan
The 34th International Conference of Photopolymer Science and Technology, Materials & Processes for Advanced Micro- lithography, Nanotechnology and Phototechnology (ICPST-34) organized by SPST will be held at International Conference Hall Makuhari Messe, Chiba, Japan on June 26 - 29, 2017. All the contributors of papers on the scientific progress and the technical development of photopolymers are cordially invited.
The conference covers a wide range of topics relevant to photopolymer science and technology in the following fields:
A. English Symposia
A3. Directed Self Assembly (DSA)
A4. Computational / Analytical Approach for Lithography Processes
A5. EUV Lithography
A6. Nanoimprint Lithography
A7. 193 nm Lithography Extension
A8. Photopolymers in 3-D Printing / Additive Manufacturing
A9. Advanced Materials for Photonic / Electronic Device and Technology
A10. Advanced 3D Packaging, Next Generation MEMS
A11. Chemistry for Advanced Photopolymer Science
A12. Organic Solar Cells – Materials, Device Physics, and Processes
A13. General Scopes of Photopolymer Science and Technology
P. Panel Symposium "EUVL insertion to HVM, and its extendability"
B. Japanese Symposia
B1. Polyimides and High Temperature Polymers
-Functionalization and Practical Applications-
B2. Plasma Photochemistry and Functionalization of Polymer Surfaces
B3. Photofunctional Materials for Electronic Devices
B4. General Scopes of Photopolymer Science and Technology
Language & Presentation
English is used for presentations in English Symposia and Panel Symposium.
Japanese and English are used for presentations in Japanese Symposia. Each presentation will not be longer than 20 minutes including discussion except for the notified lectures.
Application to Scientific Program
Apply to [ConferenceàPresentation-Information Submission at the SPST Homepage (www.spst-photopolymer.org/) before February 14, 2017.
Assoc. Prof. Haruyuki Okamura
Journal of Photopolymer Science and Technology,
Department of Applied Chemistry, Osaka Prefecture University,
1-1 Gakuen-cho, Naka-ku, Sakai, Osaka 599-8531, Japan
Phone +81-72-254-9291 Fax +81-72-254-9291
Papers submitted to ICPST-34 are published in Journal of Photopolymer Science and Technology, Vol. 30 (2017) after reviewing on the Journal's standard. Journal will be distributed to each participant during the conference. Preparation of manuscripts for the Journal should be followed to "Instructions to Authors" and "Manual for Manuscript Writing" . Submit the manuscripts to [JournalàSubmission &Reviewing of MS] at the SPST Homepage before April 1, 2017.
Registration for Participants
All the participants including speakers are requested to register in [ConferenceàRegistration] at the SPST Homepage before May 31, 2017.
Registration fee of whole conference including banquet is ￥35,000 yen until May 31, 2017 and ￥50,000 yen after June 1, 2017.
The 34th International Conference of Photopolymer Science and Technology (ICPST-34)
c/o Prof. Takashi Karatsu,
Department of Applied Chemistry
1-33 Yayoicho, Inage, Chiba 263-8522, Japan
Phone +81-43-290-3366 Fax +81-43-290-3401
Get Together will be open at 17:00 p.m on June 26, 2017
Banquet will be open at 18:00 p.m on June 28, 2017
The Society of Photopolymer Science and Technology (SPST)
President: Minoru Tsuda
Director of Administration: Takashi Karatsu
Director of Scientific Program: Masayuki Endo
Director of Publication: Haruyuki Okamura
Director of International Affairs Takeo Watanabe
ICPST-34 International Advisory Board
Xavier Allonas (France),
James Cameron (USA),
Kilwon Cho (Korea),
Danilo De Simone (Belgium),
Sanjay Malik (USA),
Patrick Naulleau (USA).
ICPST-34 Organizing Committee
Chairperson: Minoru Tsuda*,
ICPST-34 Program Committee, Chairperson: Masayuki Endo
Local Committee, Chairperson: Takashi Karatsu.