Call for papers ICPST-39 (2022) ONLINE MEETING .
The 39th International Conference of Photopolymer Science and Technology
Materials & Processes for Advanced Lithography,
Nanotechnology and Phototechnology
June 27 (Mon) - 30 (Thu), 2022
Online Meeting
Sponsored by the Society of Photopolymer Science and Technology (SPST)
In Cooperation with
The Technical Association of Photopolymers, Japan
The Chemical Society of Japan
The Society of Polymer Science, Japan
endorsed by
The Japan Society of Applied Physics
Introduction
The 39th International Conference of Photopolymer Science and Technology, Materials & Processes for Advanced Lithography, Nanotechnology and Phototechnology (ICPST-39) organized by SPSTwill be held online live meeting in the period of June 27 – 30, 2022 because of the COVID-19 pandemic.
All the contributors of papers on the scientific progress and the technical development of photopolymers are cordially invited.
Conference URL to participate will be sent to the registered email address individually after the registration and payment are completed.
Scopes
The conference covers a wide range of topics relevant to photopolymer science and technology in the following fields:
A. English Symposia
A1. Next Generation Lithography, EB Lithography and Nanotechnology
A2. Nanobiotechnology
A3. Directed Self Assembly (DSA)
A4. Computational / Analytical Approach for Lithography Processes
A5. EUV Lithography
A6. Nanoimprint
A7. 193 nm Lithography Extension and EUV HVM Readiness
A8. Photopolymers in 3-D Printing / Additive Manufacturing
A9. 2D and Stimuli Responsive Materials for Electronics & Photonics
A10. Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices
A11. Chemistry for Advanced Photopolymer Science
A12. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
A13. Fundamentals and Applications of Biomimetics Materials and Processes
A14. General Scopes of Photopolymer Science and Technology
P1. Panel Symposium “EUV Lithography toward 10 nm and below – Prospect of Achievement for Both Highly Sensitive and low LWR EUV Resist “
B. Japanese Symposia
B1. Polyimides and High Temperature Polymers -Functionalization and Practical Applications-
B2. Plasma Photochemistry and Functionalization of Polymer Surfaces
B3. General Scopes of Photopolymer Science and Technology
Language and Oral Presentation Time
English is used for presentations in English Symposia and Panel Symposium. Japanese and English are used for presentations in Japanese Symposia. Each presentation will not be longer than 20 minutes including discussion except for the notified lectures.
Deadline of Application to Scientific Program
January 20 (Thu) (00:00, JST) - February 14 (Mon) (23:59, JST), 2022.
Application to Scientific Program
Apply to [Conference → Presentation-Information Submission] at the SPST Homepage (https://www.spst-photopolymer.org/) before February 14, 2022.
Deadline of Submission of Papers
April 1 (Fri), 2022.
Papers
Papers submitted to ICPST-39 are published in Journal of Photopolymer Science and Technology, Vol. 35 (2022) after reviewing on the Journal's standard. Journal will be distributed to each participant during the conference. Preparation of manuscripts for the Journal should be followed to "Instructions to Authors" and "Manual for Manuscript Writing". Refer “Page Layout Sample” and use “Sample Manuscript (Manuscript Template)”. Submit the manuscripts to [Journal → Submission & Reviewing of MS] at the SPST Homepage before April 1, 2022. The Journal will be published and mailed before ICPST-39.
Editorial Office
Assoc. Prof. Hiroyuki Mayama
Journal of Photopolymer Science and Technology,
Department of Chemistry, Asahikawa Medical University,
2-1-1 Midorigaoka-Higashi, Asahikawa, 078-8510, Japan
Phone +81-166-68-2726 Fax +81-166-68-2782
E-mail mayama@asahikawa-med.ac.jp
Deadline of Registration for Participants
February 1 (Tue) (00:00, JST) - June 26(Sun) (23:59, JST), 2022
Registration for Participants
All the participants including speakers are requested to register in [Conference → Registration] at the SPST Homepage before June 30, 2022.
Registration fee of whole conference is ￥35,000 yen for Participants.
Registration fee of whole conference is ￥10,000 yen
for Students.
Conference Office
The 38th International Conference of Photopolymer Science and Technology (ICPST-38)
c/o Prof. Takashi Karatsu,
Department of Applied Chemistry
Chiba University
1-33 Yayoicho, Inage, Chiba 263-8522, Japan
Phone +81-43-290-3366 Fax +81-43-290-3401
e-mail office@spst-photopolymer.org
The Society of Photopolymer Science and Technology (SPST)
President: Minoru Tsuda
Director of Administration: Takashi Karatsu
Director of Scientific Program: Masayuki Endo
Director of Publication: Hiroyuki Mayama
Director of International Affairs: Takeo Watanabe
ICPST-39 International Advisory Board
Danilo De Simone (Belgium)
Sanjay Malik (USA)
Patrick Naulleau (USA)
Yusuf Yagci (Turkey)
ICPST-39 Organizing Committee
Chairperson: Minoru Tsuda
Committee Members: R. Allen, H. Araki, T. Azuma, M. Endo, T. Hayakawa, Y. Hirai, T. Hirano, T. Hirayama, H. Horibe, T. Ichiki, M. Kakimoto,T. Karatsu, Y. Kawai, S. Kondo, H. Kudo, M. Kuzuya, H. Mayama, J. Mizuno, S. Nagahara, T. Nagai, T. Nishino, H. Ohkita, Y. Ohnishi, H. Oizumi, H. Okamura, I. Osaka, S. Seki, A. Sekiguchi, T. Seshimo, A. Shibuya, K. Soga, J. Taniguchi, K. Takei, T. Ueno, T. Watanabe, T. Yamashita, W. Yueh, S. Yamakawa
ICPST-38 Program Committee, Chairperson: Masayuki Endo
Local Committee, Chairperson: Takashi Karatsu
