Conference

Call for Papers for ICPST-34 (2017)

Japanese

The 34th International Conference of Photopolymer Science and Technology

Materials & Processes for Advanced Microlithography,

Nanotechnology and Phototechnology

June 26 - 29, 2017

International Conference Hall

Makuhari Messe, Chiba, Japan

Sponsored by the Society of Photopolymer Science and Technology (SPST)

In Cooperation with

The Technical Association of Photopolymers, Japan

The Japan Society of Applied Physics

The Chemical Society of Japan

The Society of Polymer Science, Japan

Chiba University

Introduction

The 34th International Conference of Photopolymer Science and Technology, Materials & Processes for Advanced Micro- lithography, Nanotechnology and Phototechnology (ICPST-34) organized by SPST will be held at International Conference Hall Makuhari Messe, Chiba, Japan on June 26 - 29, 2017. All the contributors of papers on the scientific progress and the technical development of photopolymers are cordially invited.

Scopes

The conference covers a wide range of topics relevant to photopolymer science and technology in the following fields:

A. English Symposia

A1. Next Generation Lithography, EB Lithography and Nanotechnology

A2. Nanobiotechnology

A3. Directed Self Assembly (DSA)

A4. Computational / Analytical Approach for Lithography Processes

A5. EUV Lithography

A6. Nanoimprint Lithography

A7. 193 nm Lithography Extension

A8. Photopolymers in 3-D Printing / Additive Manufacturing

A9. Advanced Materials for Photonic / Electronic Device and Technology

A10. Advanced 3D Packaging, Next Generation MEMS

A11. Chemistry for Advanced Photopolymer Science

A12. Organic Solar Cells – Materials, Device Physics, and Processes

A13. General Scopes of Photopolymer Science and Technology

P. Panel Symposium "EUVL insertion to HVM, and its extendability"

B. Japanese Symposia

B1. Polyimides and High Temperature Polymers

-Functionalization and Practical Applications-

B2. Plasma Photochemistry and Functionalization of Polymer Surfaces

B3. Photofunctional Materials for Electronic Devices

B4. General Scopes of Photopolymer Science and Technology

Language & Presentation

English is used for presentations in English Symposia and Panel Symposium.

Japanese and English are used for presentations in Japanese Symposia. Each presentation will not be longer than 20 minutes including discussion except for the notified lectures.

Application to Scientific Program

Apply to [ConferenceàPresentation-Information Submission at the SPST Homepage (www.spst-photopolymer.org/) before February 14, 2017.

Editorial Office:

Assoc. Prof. Haruyuki Okamura

Journal of Photopolymer Science and Technology,

Department of Applied Chemistry, Osaka Prefecture University,

1-1 Gakuen-cho, Naka-ku, Sakai, Osaka 599-8531, Japan

Phone +81-72-254-9291 Fax +81-72-254-9291

E-mail okamura@chem.osakafu-u.ac.jp

Papers

Papers submitted to ICPST-34 are published in Journal of Photopolymer Science and Technology, Vol. 30 (2017) after reviewing on the Journal's standard. Journal will be distributed to each participant during the conference. Preparation of manuscripts for the Journal should be followed to "Instructions to Authors" and "Manual for Manuscript Writing" . Submit the manuscripts to [JournalàSubmission &Reviewing of MS] at the SPST Homepage before April 1, 2017.

Registration for Participants

All the participants including speakers are requested to register in [ConferenceàRegistration] at the SPST Homepage before May 31, 2017.

Registration fee of whole conference including banquet is ￥35,000 yen until May 31, 2017 and ￥50,000 yen after June 1, 2017.

Conference Office

The 34th International Conference of Photopolymer Science and Technology (ICPST-34)

c/o Prof. Takashi Karatsu,

Department of Applied Chemistry

Chiba University

1-33 Yayoicho, Inage, Chiba 263-8522, Japan

Phone +81-43-290-3366 Fax +81-43-290-3401

e-mail office@spst-photopolymer.org

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