Call for papers ICPST-40 (2023) . Under construction!


Japanese

The 40th International Conference of Photopolymer Science and Technology

Materials & Processes for Advanced Lithography,

Nanotechnology and Phototechnology

 

June 27 (Tue) - 30 (Thu), 2023

Hybrid Meeting

 

Sponsored by the Society of Photopolymer Science and Technology (SPST)

  In Cooperation with

The Technical Association of  Photopolymers, Japan

The Chemical Society of Japan

The Society of Polymer Science, Japan

  Endorsed by

       The Japan Society of Applied Physics

 

Introduction

The 40th International Conference of Photopolymer Science and Technology, Materials & Processes for Advanced Lithography, Nanotechnology and Phototechnology (ICPST-40) organized by SPST will be held at International Conference Hall, Makuhari Messe, Chiba, Japan and on On-line Meeting June 27-30, 2023.  The details will appear at the SPST Homepage.

All the contributors of papers on the scientific progress and the technical development of photopolymers are cordially invited.

 

 

Scopes

The conference covers a wide range of topics relevant to photopolymer science and technology in the following fields:

 

A. English Symposia

 

        A0.       Plenary Talk

        A1.       Next Generation Lithography, EB Lithography and Nanotechnology 

        A2.       Nanobiotechnology

        A3.       Directed Self Assembly (DSA)

        A4.       Computational / Analytical Approach for Lithography Processes

        A5.       EUV Lithography

        A6.       Nanoimprint

        A7.       193 nm Lithography Extension and EUV HVM Readiness

        A8.       Photopolymers in 3-D Printing/ Additive Manufacturing

        A9.       2D and Stimuli Responsive Materials for Electronics & Photonics

        A10.    Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices

        A11.    Chemistry for Advanced Photopolymer Science

        A12.    Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices

        A13.    Fundamentals and Applications of Biomimetics Materials and Processes

        A14.    General Scopes of Photopolymer Science and Technology

        P.         Panel Symposium

 

 

B. Japanese Symposia

 

B1.      Polyimides and High Thermally Stable Resins  -Functionalization and Practical Applications-

B2.      Plasma Photochemistry and Functionalization of Polymer Surfaces

B3.       General Scopes of Photopolymer Science and Technology 

 

Language and Oral Presentation Time

 

English is used for presentations in English Symposia and Panel Symposium. Japanese and English are used for presentations in Japanese Symposia. Each presentation will not be longer than 20 minutes including discussion except for the notified lectures. 

 

 

Deadline of Application to Scientific Program

January 20 (Thu) (00:00, JST) - February 14 (Mon) 28 (Mon) March 20 (Mon, Extended) (23:59, JST), 2022.

This is the final extension. So please adhere to the deadline.

 

Application to Scientific Program

 

Apply to [Conference → Presentation-Information Submission] at the SPST Homepage (https://www.spst-photopolymer.org/) before February 14, 2023.

   

 

Deadline of Submission of Papers

April 1 (Fri), 2022

Papers

Papers submitted to ICPST-39 are published in Journal of Photopolymer Science and Technology, Vol. 35 (2022) after reviewing on the Journal's standard. Journal will be distributed to each participant during the conference. Preparation of manuscripts for the Journal should be followed to "Instructions to Authors" and "Manual for Manuscript Writing". Refer “Page Layout Sample” and use “Sample Manuscript (Manuscript Template)”. Submit the manuscripts to [Journal → Submission & Reviewing of MS] at the SPST Homepage before April 1, 2022. The Journal will be published and mailed before ICPST-39.

 

 

Editorial Office

Assoc. Prof. Hiroyuki Mayama

Journal of Photopolymer Science and Technology,

Department of Chemistry, Asahikawa Medical University,

2-1-1 Midorigaoka-Higashi, Asahikawa, 078-8510, Japan

Phone:  +81-166-68-2726      Fax:  +81-166-68-2782

E-mail:  mayama@asahikawa-med.ac.jp

 

 

 

Deadline of Registration for Participants

February 1 (Tue) (15:00, JST) - June  26(Sun) (23:59, JST), 2022

Registration for Participants

All the participants including speakers are requested to register in [Conference → Registration] at the SPST Homepage. 

By May 31, 2023.

Registration fee of whole conference is ¥45,000 yen for Participants.

Registration fee of whole conference is ¥10,000 yen for Students.

From June 1, 2023.

Registration fee of whole conference is ¥60,000 yen for Participants.

 

Registration fee of whole conference is ¥15,000 yen for Students.

 

Banquet ¥5,000

 

 

 

 

We recommend that you register by the end of May.

 

 

Conference Office

   

The 40th International Conference of Photopolymer Science and Technology (ICPST-40)     

c/o Prof. Hiroto Kudo

Department of Applied Chemistry  

Department of Chemistry and Materials Engineering, 

Kansai University

3-3-35, Yamate-cho, Suita-shi, Osaka, 564-8680, Japan

Phone: +81-6-6368-1977  Fax: +81-6-6368-1977

E-mail office@spst-photopolymer.org

 

 

The Society of Photopolymer Science and Technology (SPST)

President:                          Takeo Watanabe

Vice President                  Teruaki Hayakawa

Director of Scientific Program: Teruaki Hayakawa

Director of Publication:         Hiroyuki Mayama

Director of Awards: Itaru Osaka

Director of Administration:         Hiroto Kudo

 

Auditor:                                          Takumi Ueno

 

                                                       

ICPST-40 International Advisory Board

Danilo De Simone (Belgium)

Sanjay Malik (USA)

Patrick Naulleau (USA)

Yusuf Yagci (Turkey)

 

 

ICPST-40 Organizing Committee

Chairperson: Takeo Watanabe 

Members: Masataka Endo, Takanori Ichiki, Kouhei Soga, Seiji Ngahara, Teruaki Hyakawa, Takehiro Sejimo, Tomoki Nagahara, Hiroto Kudo, Taku Hirayma, Shinji Yamakawa, Yoshihiko Hirai, Jun Taniguchi, Kazuma Kurihara, Yoshio Kawai, Wang Yueh, Robert Allen, Takumi Ueno, Shuhei Seki, Takashi Yamashita, Kuriharu Takei, Takashi Karatsu, Haruyuki Okamura, Akinori Shibuya, Hideo Ohkita, Itaru Osaka, Hiroyuki Mayama, Jun Sekiguchi, Takayuki Murosaki,  Hitoshi Araki, Takashi Hirano, Shin-ichi Kondo, Masayuki Kuzuya, Hideo Horibe, Masashi Yamamoto

 

 

 

 

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