ICPST-40 Program

Japanese

 

PROGRAM OUTLINE

 

PROGRAM DETAIL

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update log: 2023/06/01 upadated, 2023/05/17/22:00 updated, 05/16/21:00 updated

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Symposia

 

        A0.       Plenary Lecture

        A2.       Nanobiotechnology

        A3.       Directed Self Assembly (DSA)

        A4.       Computational / Analytical Approach for Lithography Processes

        A5.       EUV Lithography

        A6.       Nanoimprint

        A8.       Photopolymers in 3-D Printing/ Additive Manufacturing

        A10.    Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices

        A11.    Chemistry for Advanced Photopolymer Science

        A12.    Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices

        A13.    Fundamentals and Applications of Biomimetics Materials and Processes

 

        P1.       Panel symposium

 

        B1.       Japanese symposium

        B2.       Japanese symposium

        B3.       Japanese symposium

  • Scientific symposia starts on June 27th (Tue) - 30th (Fri).
  • English is used for presentations at English Symposia and Panel Symposia.
  • Presentation time, including discussion except for the notified lectures, is below.
    • Key-note: 40 min
    • Invited: 30 min
    • Oral: 20 min
  • Japanese and English will be used in the Japanese Symposia.
  • In Japanese session, organizing committee recommend presenters to prepare their slides in English as possible as they can for convenience of oversea participants.

Panel Symposium

Panel Symposium will be held in the evening of June 28th, 2023.

 

SPST Award Ceremony

SPST Award Ceremony will be held.

 

Welcome reception

Welcome reception will be held.

 

Banquet

Banquet will be held.