39th ICPST time table (online conference site version)
A. English Symposia English
OP. Opening Remarks
S1. Plenary Lecture
A1. Next Generation Lithography, EB Lithography and Nanotechnology
A2. Nanobiotechnology
A3. Directed Self Assembly (DSA)
A4. Computational / Analytical Approach for Lithography Processes
A5. EUV Lithography
A6. Nanoimprint
A7. 193 nm Lithography Extension and EUV HVM Readiness
A8. Photopolymers in 3-D Printing / Additive Manufacturing
A9. 2D and Stimuli Responsive Materials for Electronics & Photonics
A10. Strategies and Materials for Advanced Packaging, Next Generation MEMS, Flexible Devices
A11. Chemistry for Advanced Photopolymer Science
A12. Organic and Hybrid Materials for Photovoltaic and Optoelectronic Devices
A13. Fundamentals and Applications of Biomimetics Materials and Processes
A14. General Scopes of Photopolymer Science and Technology
P1. Panel Symposium "Beyond Sub-10 nm Lithography -From a Material Design and Development Perspective-"
CL. Closing Remarks
B. Japanese Symposia
B1. ポリイミド及び高温耐熱樹脂ー機能化と応用ー
B2. プラズマ光化学と高分子表面機能化
B3. 一般講演:
(1) 光物質科学の基礎 (光物理過程、光化学反応など)
(2) 光機能素子材料 (分子メモリー、情報記録材料、液晶 など)
(3) 光・レーザー・電子線を活用する合成・重合・パターニング
(4) フォトファブリケーション (光成型プロセス、リソグラフィ)
(5) レジスト除去、エッチング、洗浄
(6) 装置 (光源、照射装置、計測、プロセスなど)